Effect Of Deposition Conditions Research Articles

금속 Ni 분말을 용해한 도금용액으로부터 전기도금 된 Ni 박막 특성에 미치는 도금조건의 영향

Korea Atomic Energy Research Institute, Daejeon, 305-353, Korea(Received June 16, 2015 ; revised June 25, 2015 ; accepted June 29, 2015)AbstractChloride plating solution was fabricated by dissolving metal Ni powders in solution with HCl and de-ionized water. Effects of deposition conditions on the properties of Ni films electrodeposited from chloridebaths were studied. Current efficiency of Ni films electrodeposited from the baths containing saccharin wasdecreased with increasing the current density. Residual stress of Ni thin films ware measured to be about230 ~ 435 MPa in the range of current density of 10 ~ 25 mA/cm

Effect of deposition conditions on properties of nitrogen rich-InN nanostructures grown on anisotropic Si (110)

Nanocrystalline InN were fabricated on anisotropic silicon [Si(110)] substrates by reactive radio frequency sputtering. The effects of deposition conditions on the InN film characteristics were comprehensively studied. The films were prepared using different argon and nitrogen plasma ratios under 8×10−3mbar at different temperatures and RF powers. X-ray diffraction measurements confirmed that all deposited films are wurtzite nanocrystalline InN films with (101) preferred growth orientation. All of the samples obtained under different deposition conditions were slightly N rich. For optimized deposition conditions, InN film on Si(110) substrate shows smooth surface with root-mean-square roughness around 2nm. The optical properties of InN layers were examined by micro-Raman and FTIR spectroscopy at room temperature. The A1(TO) and E1(TO) modes observed were a consequence of the wurtzite nanocrystalline nature of RF-sputtered films.

Effect of deposition conditions and post deposition anneal on reactively sputtered titanium nitride thin films

Titanium nitride (TiNx) was deposited by reactive sputtering using a titanium target in a nitrogen ambient. Nitrogen flow rate during deposition was varied in order to investigate its effect on film resistivity. Conductivity is found to improve with increasing nitrogen content. Films were then annealed, varying the time and temperature of the anneal. Resistivity was found to decrease with longer annealing time and higher temperature during post deposition annealing. TiNx films showed good thermal and electrical stability upon annealing and did not show any silicon diffusion. It was found that film orientation can influence the resistivity, with [111] oriented films more resistive than [200] oriented films. Moreover, re-crystallization effects brought on by post deposition annealing cause the resistivity to decrease. Films deposited above 20% nitrogen flow rates during deposition were all stoichiometric TiN. However, TiNx deposited at very high nitrogen flow rate was found to be electrically, thermally and morphologically more stable than the ones deposited at low nitrogen flow rates.

Structure, mechanical and tribological properties of self-lubricant W–S–N coatings

W–S–N self-lubricant coatings were deposited by d.c. reactive magnetron sputtering at two total discharge pressures of 0.6 and 1.2Pa. The nitrogen content and S/W ratio varied from 0 to 30at.%, and 0.6 to 1.6, respectively. The effect of deposition conditions on chemical composition, structure and mechanical properties was studied; coatings with the most promising properties have been selected for tribological testing. Coatings were nanostructured with nanograins of tungsten disulfide; the size of which decreased with increasing nitrogen content. Hardness increased with N content up to 7GPa for coating deposited with a discharge pressure of 1.2Pa; coatings deposited at lower pressure exhibited hardness around 9GPa. Friction and wear behavior in humid air and dry nitrogen was evaluated using a pin-on-disk tribometer. The wear tracks and the ball wear scars were analyzed by Raman spectroscopy and scanning electron microscopy. Although the friction coefficient in dry nitrogen was significantly lower than in humid air, the wear rate was similar for both environments. Detailed wear track surface analysis showed that the tribolayer formed on the surface contained mostly tungsten disulfide and tungsten oxide.

Improving the laser damage resistance of oxide thin films and multilayers via tailoring ion beam sputtering parameters

Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due to its advantages such as uniformity, reproducibility, suitability for multilayer coatings and growth of dielectric materials with high packing densities. In this study, single Ta2O5 layers and Ta2O5/SiO2 heterostructures were deposited on optical quality glass substrates by dual ion beam sputtering. We focused on the effect of deposition conditions like substrate cleaning, assistance by 12cm diameter ion beam source and oxygen partial pressure on the laser-induced damage threshold of Ta2O5 single layers. Afterwards, the obtained information is employed to a sample design and produces a Ta2O5/SiO2 multilayer structure demonstrating low laser-induced damage without a post treatment procedure.

Effect of Deposition Conditions on the Electrochromic Properties of Nanostructured Thin Films of Ammonium Intercalated Vanadium Pentoxide Xerogel

We have examined the influence of the deposition temperature and deposition time on the electrochromic activity of nanostructured (NH4)0.3V2O5·1.25H2O thin films prepared by the newly developed chemical bath deposition method. The film structure is characterized by XRD powder diffraction, IR spectroscopy, and TG-DTA techniques. SEM and AFM observations evidence that the common ribbon-like structure is modified by the different deposition conditions mainly with respect to the particle sizes, ribbons orientation, and films porosity. The electrochemical and electrochromic properties of two series of thin films prepared at 50 and 85 °C for different deposition time are studied. All films exhibit two-step electrochromism with color changes yellow/green and green/blue, related to the stepwise reduction/oxidation processes between V(V) and V(IV) sites. The electrochromic changes are stable after prolonged film storage and for at least a hundred cycles. The optical properties of (NH4)0.3V2O5·1.25H2O thin films are found to depend significantly on the deposition conditions as the higher deposition temperature is favorable in providing higher values of the transmittance variance. The best result achieved for the transmittance variance of 55% at 400 and 900 nm clearly demonstrates the potential of ammonium intercalated vanadium oxide xerogel thin films for commercial application in electrochromic devices.

Preparation and Characterization of Bulk Porous Nickel Fabricated by Novel Scanning Jet Electrodeposition

The bulk porous nickel was fabricated by layer scanning jet electrodeposition, a novel porous metal preparation technique. The dendritic crystalline layer or normal layer of the bulk porous nickel can be obtained by controlling of the growth conditions. The effects of deposition conditions, such as jet velocity, deposition current density, jet scanning mode, scanning rate, electrolyte solution, etc., on the morphology and growth process of the dendritic structures were studied in detail. It is revealed that the deposition rate and the uniformity of the pore distribution for the bulk porous Ni increase with the decrease of jet velocity. The depositing current density has an upper and lower limit. The dendritic structures are sensitive to the scanning rate, scanning mode, electrolyte solution. As a result, the optimized bulk porous nickels with controllable dendritic crystalline layered structure, pore size and porosity were fabricated by accurately controlling the growth conditions above.

Evaluation of the role of polyelectrolyte deposition conditions in growth factor release.

Polyelectrolyte multilayer coatings were prepared from solutions of poly(methacrylic acid) and poly-l-histidine. Bone morphogenetic protein 2 (BMP-2) was adsorbed onto the surface of anodized titanium and polyelectrolyte multilayer coatings were built up on top of the BMP-2. The effect of deposition conditions on coating properties and preosteoblast response was measured by comparing coatings prepared under natural conditions to those prepared from solutions at pH = 6.0 and solutions containing 0.1 M NaCl. High levels of BMP-2 release were achieved, with coatings prepared from pH = 6.0 solutions releasing 86 ng cm-2 and coatings prepared from solutions containing 0.1 M NaCl releasing 114 ng cm-2 over 25 days. Enhanced preosteoblast differentiation was observed on coatings prepared from modified solutions; however, this increased differentiation was apparent for BMP-2-eluting and control coatings. Additionally, a positive relationship between surface roughness and differentiation was observed, which may account for increased differentiation for systems that do not release BMP-2.

Effect of Pulse Electrodeposition on Properties of Nanocrystalline Nickel Coatings

In this work, nanocrystalline nickel coatings were electrodeposited from a Watts bath using direct (DC) and pulsed (PC) current. Effect of deposition conditions on the morphology, hardness, grain size, surface roughness and corrosion resistance of nickel coatings were investigated. Ni films deposited by PC method exhibited greater hardness values and smaller crystallite size compared to those deposited by DC method. A preferential crystallographic orientation or texture was found in the nickel films depending upon the electrodeposition pulse shape, as it is polycrystalline in the DC electrodeposited films, while exhibit <111> crystallographic growth direction for PC method. Corrosion evaluation results showed that the PC electrodeposited nanocrystalline Ni films have higher corrosion resistant compared to those deposited with the DC method in 2 mol/liter NaOH solution.

Complete Permittivity Tensor in Sputtered CuFe₂O₄ Thin Films at Photon Energies between 2 and 5 eV.

This work is devoted to the systematic study of the optical and magneto-optical properties of sputter deposited CuFeO thin films in the photon energy region between 2 and 5 eV using spectroscopic ellipsometry and magneto-optical Kerr spectroscopy. The spectral dependence of both the diagonal and off-diagonal elements of the permittivity tensor is determined. A complete picture about the electron transitions in CuFeO is suggested in the frame of intervalence charge transfer and intersublattice charge transfer transitions. The effect of deposition conditions and post-deposition treatment in CuFeO films upon the optical and magneto-optical properties is discussed.

Characteristics of surface acoustic waves excited by (1120) ZnO films deposited on R-sapphire substrates.

(1120)-textured ZnO films are deposited on Rsapphire substrate by RF magnetron sputtering and the effects of deposition conditions on ZnO films are investigated. The chemical compositions of the ZnO films are characterized by X-ray photoelectron spectroscopy and the results indicate that the ratio of latticed oxygen to zinc increases with increasing of oxygen concentration in the sputtering gas, which demonstrates the improvement of crystal structures in ZnO films. To investigate the characteristics of surface acoustic waves excited by the (1120)-textured ZnO films, SAW delay lines based on layered structures of (1120) ZnO film/R-sapphire substrate are fabricated, in which Rayleigh and Love modes are excited along the (0001)- and (1100)-directions of the ZnO films, respectively. The phase velocities and electromechanical coupling factors of both wave modes are characterized as functions of the film-thickness-to-wavelength ratio. The acoustic properties of the layered structures are calculated using the transfer matrix method. The experimental and theoretical results are in good agreement with each other.

Effects of laser power on the growth of polycrystalline AlN films by laser chemical vapor deposition method

Polycrystalline aluminum nitride (AlN) films were prepared by laser chemical vapor deposition method using aluminum acetylacetonate and ammonia as source materials. The effects of deposition conditions on the crystal phase, composition and microstructure were investigated. Polycrystalline AlN films were prepared at a laser power above 100W and a deposition temperature above 803K. The microstructure of AlN film changed from aggregated grains to faceted grains to pyramidal grains with increasing laser power and with decreasing total pressure.

The Effect of the Deposition Conditions on the Electrodeposition of Si Nanopillars in TMHATFSI

Si nanopillars were prepared by electrodeposition from SiCl4 in an ionic liquid, specifically tri-methyl-n-hexyl ammonium bis-(trifluorosulfonyl) imide (TMHATFSI), and the effects of the various deposition conditions, such as bath temperature and deposition potential, were investigated. For the preparation of the patterned substrates, UV-nanoimprint lithography was employed. The thickness of resist was 90-100 nm, mold feature diameter was 150 nm, with a pitch of 450 nm. As a result, compact Si nanopillars were uniformly electrodeposited, and it was indicated that their morphology were affected mostly by the bath temperature.

Electron microscopy of phase and structural transformations in soft magnetic nanocrystalline Fe-Zr-N films

The effect of deposition conditions (film thickness) on the structure of soft magnetic Fe80–78Zr10N10–12 films formed by reactive magnetron deposition on a heat-resistant glass substrate has been investigated by analytical transmission electron microscopy, high-resolution electron microscopy, and diffraction analysis. The processes of evolution of the phase and structural state of films and the film-substrate interface upon annealing in the temperature range of 200–650°C have been analyzed taking into account the thermodynamic, kinetic, and structural factors and the specific features of the nanocrystalline state.

Effect of deposition conditions on thickness and permeability of the multilayer films formed from natural polyelectrolytes

Formation of films from natural polyelectrolytes opens a wide range of application in the areas like tissue engineering, implantation of medical devices or other medical fields. The permeability of films, fabricated from the natural polyelectrolytes by using the layer by layer method, was determined by the cyclic voltamperometry. Using the electroactive molecules that differ in molecular size the porosity of films was examined. We compared the thickness and permeability of multilayer films composed from biocompatible and natural polyelectrolytes with ones composed from the model polycation/polyanion pair, PAH/PSS (polyallylamine hydrochloride/poly(4-styrenesulfonate)). We attributed the difference in the permeability of films with similar thickness to the higher chain stiffness of natural polyelectrolytes. The effect of the anchoring PEI (poly(ethyleneimine)) layer was also examined.

Atmospheric Pressure Deposition of Thin Functional Coatings: Polymer Surface Patterning by DBD and Post‐Discharge Polymerization of Liquid Vinyl Monomer from Surface Radicals

AbstractWe present a route for grafting polyacid and polyether coatings on polymers by post‐discharge polymerization of liquid vinyl monomer. Surface modifications of polymer films by Micro‐Discharges in air Dielectric Barrier Discharge (MD, DBD) are depicted with sub‐micrometer craters homogeneously distributed. Both the energy per MD and the power density are critical to avoid thermal film deformation. Homogeneous surface composition is related to the DBD energy density. The polymerization mechanism is depicted from yields versus DBD energy density and time of exposure to air between DBD and monomer deposition. Both parameters control the surface density of radicals and peroxides, triggering the post‐DBD polymerization with 80 and 73% of monomer functionality remaining in acid and ether coatings, respectively. The effect of deposition conditions on coatings properties is shown as well as the stability of coatings upon washing. magnified image

Effects of deposition conditions on the structural and acoustic characteristics of (1120) ZnO thin films on R-sapphire substrates

(1120) ZnO films with the c-axis lying in the plane deposited on R-sapphire substrates by RF magnetron sputtering are studied. The focusing investigation is the effect of substrate positions in the sputtering on structural and acoustic characteristics of the ZnO films. The crystallographic characteristics of the films are characterized by X-ray diffraction analysis. It is found that the crystalline orientation of ZnO films varies with the variation of substrate position deviated from the normal direction of the anode center and there is an optimized deviation position. To investigate the variations of acoustic characteristics of these piezoelectric ZnO films, multilayered structures are prepared to fabricate shear-mode highovertone bulk acoustic resonators (HBARs). The results show that the electromechanical coupling coefficient k(15) of the (1120) ZnO films obtained at the optimized position approaches a maximum.

Effect of Deposition Conditions on the Characterization of Cu(In,Ga)Se<sub>2</sub> Precursor Films by Sputtering Process

In this study, Cu(In,Ga)Se2 (CIGS) thin films were deposited onto bi-layer Mo coated soda-lime glass by sputtering a chalcopyrite CIGS quaternary alloy target. The influence of sputtering power and substrate temperature on the characterization of CIGS precursor films was investigated. Experimental results demonstrate that the CIGS quaternary target has the characteristics of chalcopyrite structures. The samples deposited at a sputter power of 1.5 W/cm2 (both as-deposited and after annealing) exhibited superior uniformity, and the phenomenon of composition loss resulting from annealing was not drastic. The composition distribution of as-deposited film produced at a substrate temperature 373 K approached that of ideal stoichiometry.

Reactive Sputtering Growth and Characterizations of InN Thin Films on Si Substrates

We have studied the effects of deposition conditions on the crystal structure of InN films deposited on Si substrate. InN thin films have been deposited on Si(100) substrates by reactive radio frequency (RF) magnetron sputtering method with pure In target at room temperature. The nitrogen gas pressure, applied RF power and the distance between target and substrate were 2×10-2 Torr, 60 W and 8 cm, respectively. The effects of the Ar–N2 sputtering gas mixture on the structural properties of the films were investigated by using scanning electron microscope, energy-dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction techniques.

Characterization of catalytic chemical vapor-deposited SiCN thin film coatings

Silicon carbonitride thin films of 480 to 730-nm thicknesses were grown on silicon substrate using ammonia and hexamethyldisilazane gas sources using catalytic chemical vapor deposition process. Compositions of silicon, carbon and nitrogen in the SiCN films were varied by changing the flow rate of ammonia gas. The effect of deposition conditions on the structural, optical and mechanical properties of SiCN thin films was examined. X-ray photoelectron spectroscopy analysis indicated that the higher flow rate of ammonia gas results in higher nitrogen and lower carbon content in the deposited thin films. The measurement of stress as a function of substrate temperature in the SiCN film showed that the stress changes from compressive to tensile in the range of 275°C to 325°C. With these preliminary characterization tests, it is expected that SiCN nano-thin films can be used for developing sensors for harsh environment.