Grating Duty Cycle Research Articles

Optimal Design and Analysis of Wide-Band Near-Infrared Hybrid Dielectric Gratings with High Transmission Efficiency.

Since surface relief transmission gratings have very strict requirements on operators and use environment, according to the semiconductor laser external cavity spectral beam combining system, this paper proposes a design scheme for a semiconductor laser array spectral beam combining system based on the grating-external cavity. The finite element approach was used to create a wideband, high-efficiency fill-in multilayer dielectric transmission grating structure for a high-power spectrum beam combining system. The incidence angle, ridge height, duty cycle, and sidewall inclination angle of the transmission grating were tuned and evaluated, and a link between the transmission grating's diffraction efficiency and grating characteristics was discovered. The calculated design of the high-power fused silica transmission grating has a negative first-order peak diffraction efficiency of 99.5% in the 800 nm range. In the spectral region of 765-872 nm, the transmission grating's diffraction effectiveness exceeds 92%. The filled ultra-high diffraction efficiency multilayer dielectric transmission grating design addresses the issue of resistance to high-power lasers under complicated operating settings. It is intended to maintain a high diffraction efficiency even after several cleaning cycles, and it is an ideal component for high-power spectrum beam combining systems.

Design of the Single Heterogeneous Quantum Dot Lasers Emitting 4 Wavelengths Using Combination‐Grating Technology

AbstractMulti‐wavelength light sources are crucial for high‐bandwidth silicon photonic chips. In this paper, a single heterogeneous quantum dot distributed feedback (DFB) laser emitting 4 wavelengths using the combination‐grating technology is designed. To the best of the knowledge, this is the first heterogeneously integrated quantum dot DFB laser that lases stable multi‐wavelength in a single cavity. When the etching depth, etching width, and total length of gratings are 100 , 550 nm, and 1 000 µm, respectively, 4‐wavelength with 1297.01 , 1303.38 , 1309.74 , and 1316.11 nm are obtained by varying the grating period from 196 to 199 nm with the spacing of 1 nm. Compared to the conventional DFB laser arrays, the DFB laser units are significantly reduced by 3/4 while maintaining the same number of output wavelengths. Additionally, by optimizing the λ/4 phase‐shift position and the duty cycle of gratings, the output power at the front‐end of the 4‐wavelength laser is significantly improved. Specifically, the ratio of the output power from the front‐end and rear‐end of the laser increases from the conventional 1.00 to 2.51. This work provides a competitive candidate for multi‐wavelength, high‐performance, and large‐scale silicon‐based light sources used in data centers, lidar, and component detection.

Design terahertz polarizers and vector polarized vortex terahertz wave generators based on the effective dielectric constant of metal gratings.

Polarization and phase devices for terahertz waves have important applications in terahertz detection, imaging, communication, etc. Spatially variable metal gratings can be used for broad-spectrum, miniaturized, and low-cost terahertz polarization and phase modulation devices. Based on the effective dielectric constant and the theory of light propagation in multilayer media, we obtain the relationship between the transmittance and extinction ratio and the parameters such as the duty cycle of the metal grating, the frequency of the incident terahertz wave, the angle of incidence, the thickness of the metal grating, the refractive index of the substrate, and the thickness of the substrate. We propose a method of designing a spatially variable metal grating located on a transparent substrate. The designed spatially variable metal grating is also used to modulate the terahertz spatial polarization and phase to generate terahertz optical fields whose polarization and phase change simultaneously in space, such as azimuthally vector vortex terahertz optical fields, radially vector vortex terahertz optical fields, and so on. This will have important applications in terahertz time-domain spectroscopic detection, terahertz time-domain spectroscopic imaging, terahertz time-domain near-field microscopic imaging, terahertz communication, and so on.

Design of 16-wavelength high-power heterogeneous III-V/Si laser arrays with varying stripe width and grating period

Multi-wavelength laser array is currently one of the most attractive technologies to provide high density links for advanced optical communications and computing. The conventional scheme of varying grating period is almost impossible to achieve 8-wavelength or more. And, the optical output power of heterogeneously integrated quantum dot laser can hardly meet the commercial demand. In this paper, we report a 16-wavelength high-power heterogeneously integrated quantum dot distributed feedback laser array. To the best of our knowledge, this is the first heterogeneously integrated quantum dot laser array that tunes the lasing wavelength by combining the scheme of varying the stripe width and grating period of laser units. The effective refractive index of gratings is calculated by eigenmode expansion method. When the grating period is fixed at 198 nm, and the stripe widths of laser units are 2.00 μm, 2.25 μm, 2.60 μm and 3.15 μm, respectively, the corresponding lasing wavelengths are 1307.94 nm, 1308.49 nm, 1309.06 nm and 1309.63 nm, respectively, and the wavelength spacing of the adjacent laser units is about 100 GHz. By additionally adjusting the grating period between 196 nm and 202 nm with 2 nm spacing of grating period, a 16-wavelength QD DFB laser array is designed with the wavelength range from 1294.73 nm to 1336.09 nm. In addition, asymmetric distributed feedback grating is adopted to improve the optical output power at the front-end of laser arrays. The maximum ratio of the output power at the both end of laser units is 19.6 when the grating duty cycles of the front-end and the back-end of the λ/4 phase-shift is 0.7 and 0.5, respectively, and the grating lengths is 250 μm and 450 μm, respectively. This work will promote the performance improvement of heterogeneously integrated quantum dot lasers and develop the quantum dot lasers towards multi-wavelength.

Improving grating duty cycle uniformity: amplitude-splitting flat-top beam laser interference lithography.

Laser interference lithography is an effective approach for grating fabrication. As a key parameter of the grating profile, the duty cycle determines the diffraction characteristics and is associated with the irradiance of the exposure beam. In this study, we developed a fabrication technique amplitude-splitting flat-top beam interference lithography to improve duty cycle uniformity. The relationship between the duty cycle uniformity and irradiance of the exposure beam is analyzed, and the results indicate that when the beam irradiance nonuniformity is less than 20%, the grating duty cycle nonuniformity is maintained below ±2%. Moreover, an experimental amplitude-splitting flat-top beam interference lithography system is developed to realize an incident beam irradiance nonuniformity of 21%. The full-aperture duty cycle nonuniformity of the fabricated grating is less than ±3%. Amplitude-splitting flat-top beam interference lithography improves duty cycle uniformity, greatly reduces energy loss compared to conventional apodization, and is more suitable for manufacturing highly uniform gratings over large areas.

Electrically tunable grating metamaterials polarization-independent filter based on graphene–lithium niobate

In this paper, we propose an electrically tunable coupling filter that utilizes orthogonal gratings together with graphene. The position of the transmission valley can be altered by varying the gate voltage’s strength, and the electrotunable properties of lithium niobate are described. Under resonance conditions, monolayer graphene is comparable to a conductive electrode that completes all of this device’s absorption. By optimizing the substrate thickness and grating duty cycle, this device can achieve perfect filtering with an absorption rate of 99% at 801 nm. Coupled mode theory is also used to explain the spectrum response. Additionally, we discover that this serial filter exhibits polarization insensitive properties between 0 to 30 degree, such a filter with superior performance will play an significant role in fields such as plasmonic nanowaveguides.

Design of a binary metal micron grating and its application in near-infrared hot-electron photodetectors.

Metal plasmonic nano-gratings possess a high absorption ability and exhibit potential applications in sensing, hot-electron photodetection, metasurfaces, etc. However, the fabrication techniques of high-quality nano-gratings are challenging. In this article, a binary metal micron grating for near-infrared hot-electron photodetectors (HEPDs) is designed in which the surface plasmons are excited by high-diffraction-order modes. The high-diffraction-order micron grating can be fabricated by conventional lithography and has a significantly higher tolerance in the grating parameters than a nano-grating. The range of absorption greater than 70% is ∼3 times that of a nano-grating. Moreover, an interesting relationship between the resonant wavelength and the grating duty cycle is found. When the high-diffraction-order micron grating is applied in metal-insulator-metal HEPDs, a high zero-biased responsivity of 0.533 mA/W is achieved.

Design and Preparation of Anti-Reflection Nanoarray Structure on the Surface of Space Solar Cell Glass Cover

Space solar cell glass covers require high radiation resistance and wide-spectrum high light transmittance. The existing research on the preparation of thin films or special optical structures on the surface of solar cells rarely involves systematic research and the precise control of the high transmittance structural parameters of specific spectral bands by glass covers. Nanoarray structures were designed and constructed on high-purity quartz glass covers, achieving high anti-reflection within the 350–1100 nm range, the high energy part of the solar spectrum on Mars, regardless of the preparation of antireflective film and its radiation resistance. First, G-Solver software package was used to establish a nanoarray structure model according to the equivalent medium theory, and the effects of structural parameters such as the grating period, grating depth, and duty cycle on the glass cover transmittance were investigated. The results show that when the grating period is 50–200 nm, the transmittance ranges from 97.8% to 99.9%. When the grating period further increases from 300 nm, the lowest point of the transmittance spectrum moves to the longwave direction, and the transmittance from 350 nm to the lowest transmittance point significantly reduces. The optimal grating depth is 500 nm for a 300 nm grating period, the transmittance at 350 nm reaches 88.91%, and the average transmittance is 98.23%. When the period is 300 nm and the depth is 500 nm, the optimal duty cycle is 0.67, the transmittance at 350 nm reaches 96.52%, and the average transmittance is 99.23%. Nanoarray structures were constructed on the glass covers with nanoimprint and plasma etching, then modified with atomic layer deposition (ALD) to adjust their depth and duty cycle. The influence rules of the grating period, depth, and duty cycle on the cover transmittance from the experimental results are basically consistent with those from the simulation calculation. The nanoarray structure increases the average transmittance within 350–1100 nm of the glass cover by an average of 2.02% and the peak transmittance by 2.66%. The research results and experimental methods of this study have application value and promotion prospects for improving the photoelectric conversion efficiency of space solar cells and ground solar cells.

16-Channel Wavelength Division Multiplexers Based on Subwavelength Grating

Wavelength Division Multiplexing (WDM) plays an important role in optical interconnection. In this paper, a 16-channel WDM device is designed on a Silicon-On-Insulator (SOI) substrate by using a sub-wavelength grating (SWG) structure, which can cover O-band and C-band at the same time, and the output channel is reversely coupled from the main waveguide to realize wavelength demultiplexing. The simulation results show that the loss of our 16-channel wavelength demultiplexing device is less than 0.5 dB and the crosstalk is less than 17 dB. When WDM is performed in O-band, the transmission loss of the C-band in the bus waveguide is less than 0.05 dB and is insensitive to the grating duty cycle, with good process tolerance. The footprint of the device is 200 μm × 150 μm, and the size of the single-channel filter is 200 μm × 2 μm, which can realize WDM with large bandwidth in a compact structure.

Modeling and Simulation of Si Grating Photodetector Fabricated Using MACE Method for NIR Spectrum

In this research, we modeled a silicon-based photodetector for the NIR-IR spectrum using a grating structure fabricated using the metal-assisted chemical etching method. A nanostructure fabricated by using this method is free of defects such as unwanted sidewall metal depositions. The device is simulated using Lumerical finite difference time domain (FDTD) for optical characteristics and Lumerical CHARGE for electrical characteristics. First, we optimized the grating structure duty cycle parameter for maximum optical power absorption using the particle swarm optimization algorithm provided in Lumerical FDTD, and then used the optimized parameter for our simulations. From Lumerical FDTD simulations, we found that the Cr masker metal used in the fabrication process acts as a resonant cavity and a potential candidate for internal photo emission (IPE) effects. By using Lumerical CHARGE, we performed electrical simulation and by adding the IPE calculation we found that at 850 nm wavelength the Si grating photodetector device exhibited 19 mA/W responsivity and detectivity of 2.62 × 106 Jones for −1 volt operating voltage.

Active waveguide Bragg lasers via conformal contact PDMS stamps

Lasing is observed in Bragg lasers formed through conformal contact of a patterned PDMS stamp with a plain active film, spincoated on glass. The thresholds, output efficiencies and spectral characteristics are compared to standard substrate patterned gratings and is discussed in relation to the coupling coefficient upkappa . The reported thresholds are highly sensitive in distributed feedback (DFB) lasers to grating duty cycles, for both PDMS-air and substrate–film lasers. Overall, laser thresholds of PDMS-air (PA) DFB lasers are found to be significantly higher than substrate–film (SF) lasers, which is attributed to an approximate three-fold reduction of optical-confinement in the grating region. Slope output efficiencies are found to be comparatively higher in PA lasers relative to SF lasers for both DFB and DBR configurations and is attributed to several competing factors. The PDMS can be removed from the surface of the active film repeatedly and conformal contact is limited mainly by the particle build up on the PDMS surface. The proposed PA system is expected to be useful in rapid laser metrology of new gain materials and in practical applications of optically pumped lasers.

Compact and broadband on-chip silicon polarization beam splitter based on tilted subwavelength grating

Efficient polarization management is a key issue for on-chip silicon photonic integrated circuits. Here, we propose a compact and broadband on-chip silicon polarization beam splitter (PBS) using tilted subwavelength grating (SWG) structure. The key polarization separation region consists of an input tapered SWG, a titled SWG, and two output tapered SWGs at both output ports. The tilted SWG has a strong polarization dependence for the mode coupling, and we have introduced different grating duty cycles, positional offset, and a new, to the best of our knowledge, output mode transition structure to enhance the device performance. Based on these techniques, the key coupling length of the proposed PBS is only 5 µm (total length, 12 µm), together with polarization extinction ratio (ER) 21.2 dB (19.7 dB) and insertion loss 0.21 dB (0.39 dB) for the TE (TM) mode. Moreover, the device working bandwidth can be extended to 311 nm (154 nm) by keeping E R > 15 d B ( E R > 18 d B ), satisfying the on-chip broadband applications. We believe the proposed device could become a good candidate to boost the on-chip polarization management toward compact and broadband directions.

A Design Method of Two-Dimensional Subwavelength Grating Filter Based on Deep Learning Series Feedback Neural Network.

Subwavelength grating structure has excellent filtering characteristics, and its traditional design method needs a lot of computational costs. This work proposed a design method of two-dimensional subwavelength grating filter based on a series feedback neural network, which can realize forward simulation and backward design. It was programed in Python to study the filtering characteristics of two-dimensional subwavelength grating in the range of 0.4–0.7 µm. The shape, height, period, duty cycle, and waveguide layer height of two-dimensional subwavelength grating were taken into consideration. The dataset, containing 46,080 groups of data, was generated through numerical simulation of rigorous coupled-wave analysis (RCWA). The optimal network was five layers, 128 × 512 × 512 × 128 × 61 nodes, and 64 batch size. The loss function of the series feedback neural network is as low as 0.024. Meanwhile, it solves the problem of non-convergence of the network reverse design due to the non-uniqueness of data. The series feedback neural network can give the geometrical structure parameters of two-dimensional subwavelength grating within 1.12 s, and the correlation between the design results and the theoretical spectrum is greater than 0.65, which belongs to a strong correlation. This study provides a new method for the design of two-dimensional subwavelength grating, which is quicker and more accurate compared with the traditional method.

Diffraction gratings based on a multilayer silicon nitride waveguide with high upward efficiency and large effective length.

Diffraction gratings with high upward diffraction efficiency and large effective length are required for chip-scale light detection and ranging. We propose a diffraction grating based on a multilayer silicon nitride waveguide, which theoretically achieves an upward diffraction efficiency of 92%, a near-field effective length of 376 µm, and a far-field divergence angle of 0.105° at a wavelength of 850 nm. The diffraction grating has a high tolerance to process variations based on Monte Carlo analysis. When the conditions are ±5% layer thickness variation, ±50nm lithographic variation, and ±20nm wavelength drift, more than 71% of the grating samples have a diffraction efficiency higher than 80%, and 100% of the samples have an effective length larger than 200 µm (corresponding to a far-field divergence <0.2∘). Furthermore, the near-field effective length of the grating with an upward diffraction efficiency above 90% can be adjusted from hundreds of microns to centimeters by changing the etching layer thickness and the grating duty cycle. This diffraction grating has a potential application in optical sensing and imaging from visible to near-IR wavelengths.

Spectral and Sensing Performance of Long-Period Fiber Gratings at 2 μm Waveband

In this paper, we demonstrate the transmission spectral and surrounding refractive index (SRI) sensing performance of long-period fiber gratings (LPFGs) at 2 &#x03BC;m waveband. The cladding modes operating at 2 &#x03BC;m waveband show higher SRI sensitivity than 1.55 &#x03BC;m waveband. The influence of a little off resonance region of grating period, refractive index modulation and duty cycle of gratings are analyzed theoretically. Additionally, the LPFGs of LP₀₈ mode near dispersion turning point operating at 2 &#x03BC;m waveband are investigated theoretically and experimentally. Mode splitting brings out with the increasing SRI. After the resonant dip splitting into two dips (dip A and dip A&#x2032;), the SRI sensitivity of dip A are measured to be as high as &#x2212;8495.2 nm&#x002F;RIU in the SRI region of 1.445&#x2013;1.457. The proposed 2-&#x03BC;m-waveband LPFGs makes it a potential in biochemical and environmental monitoring.

SOI Waveguide Bragg Grating Photonic Sensor for Human Body Temperature Measurement Based on Photonic Integrated Interrogator.

A waveguide Bragg grating (WBG) provides a flexible way for measurement, and it could even be used to measure body temperature like e-skin. We designed and compared three structures of WBG with the grating period, etching depth, and duty cycle. The two-sided WBG was fabricated. An experimental platform based on photonic integrated interrogator was set up and the experiment on the two-sided WBG was performed. Results show that the two-sided WBG can be used to measure temperature changes over the range of 35–42 °C, with a temperature measurement error of 0.1 °C. This approach has the potential to facilitate application of such a silicon-on-insulator (SOI) WBG photonic sensor to wearable technology and realize the measurement of human temperature.

Broadband and scalable silicon-based mode multiplexer using subwavelength-grating-based adiabatic coupler

A broadband and scalable mode multiplexer (MUX) using an adiabatic coupler (AC) assisted with subwavelength grating (SWG) is proposed and analyzed in detail. The adiabatic coupler consists of a strip bus waveguide and a tapered waveguide whose width decreases along the propagation direction so that the fundamental TE mode cannot be supported well and will be coupled into the high-order mode in the bus waveguide via mode evolution due to the phase matching. On the contrary, the fundamental TE mode injected into the bus waveguide will keep propagating in the same waveguide with negligible coupling. The SWG is incorporated into the gap between the bus and tapered waveguides for effectively enhancing the mode coupling, leading to a reduction in length of the device. By carefully choosing the structural parameters, the proposed TE0 / TE1 mode MUX shows a low insertion loss (IL) of 0.07 dB (0.01 dB) and crosstalk (CT) of −24.01 dB (−21.25 dB) for the coupled TE1 mode (the through TE0 mode) at wavelength 1550 nm while the coupling length is compact as ∼8.8 μm. The device achieves a broad bandwidth of 165 nm for CT < − 19 dB and IL < 0.11 dB over a wavelength range of 1460 to 1625 nm, covering the whole S, C, and L bands. Moreover, the device also shows a good fabrication tolerance to the deviations of the waveguide width, the total height of the device and the grating duty cycle. In addition, the TE2 and TE3 multiplexing are also presented, showing the scalability of the proposed scheme.

Low-Threshold Nanolaser Based on Hybrid Plasmonic Waveguide Mode Supported by Metallic Grating Waveguide Structure.

A high Q-factor of the nanocavity can effectively reduce the threshold of nanolasers. In this paper, a modified nanostructure composed of a silver grating on a low-index dielectric layer (LID) and a high-index dielectric layer (HID) was proposed to realize a nanolaser with a lower lasing threshold. The nanostructure supports a hybrid plasmonic waveguide mode with a very-narrow line-width that can be reduced to about 1.79 nm by adjusting the thickness of the LID/HID layer or the duty ratio of grating, and the Q-factor can reach up to about 348. We theoretically demonstrated the lasing behavior of the modified nanostructures using the model of the combination of the classical electrodynamics and the four-level two-electron model of the gain material. The results demonstrated that the nanolaser based on the hybrid plasmonic waveguide mode can really reduce the lasing threshold to 0.042 mJ/cm2, which is about three times lower than the nanolaser based on the surface plasmon. The lasing action can be modulated by the thickness of the LID layer, the thickness of the HID layer and the duty cycle of grating. Our findings could provide a useful guideline to design low-threshold and highly-efficient miniaturized lasers.

Compact and broadband mode demultiplexer using a subwavelength grating engineered MMI coupler

A compact and broadband mode demultiplexer (DEMUX) using a subwavelength grating (SWG) engineered multimode interference (MMI) coupler is proposed and analyzed in detail. To effectively separate the input T E 0 and T E 1 modes, the input port is formed by cascading two tapers, connected by a silicon wire, in a single SWG MMI coupler. Moreover, by partially tailoring the grating duty cycle of the SWGs, an extra phase shifter is directly integrated in the MMI coupler, parallel to the input port for adjusting the phase in mode conversion. The input T E 0 mode can pass through the first taper and the silicon wire while being cut off and evolve into SWGs in the second taper, so that it is hardly affected by the extra phase shifter and directly mapped into the output port via MMI. On the contrary, the input T E 1 mode is cut off in the first taper and evolves through the sidewall of the first taper into two T E 0 -like components in the SWG region. Then an extra π / 2 phase shift between them is generated by the phase shifter. Finally, they are combined into the output T E 0 mode via MMI. By carefully choosing the structural parameters, the proposed T E 0 / T E 1 mode DEMUX shows a broad bandwidth of 350 nm from 1520 to 1870 nm for insertion loss &lt; 1.0 d B and cross talk &lt; − 10 d B and achieves a low insertion loss of 0.37 dB/0.40 dB and cross talk of − 18.50 d B / − 17.00 d B for T E 0 / T E 1 input at 1550 nm, within a short device length of only 18.6 µm. In addition, the device also shows a good fabrication tolerance to the deviations of structure parameters.

Refractive index sensor based on a Tamm Fabry-Perot hybrid resonance.

A highly sensitive refractive index sensor is proposed by using the resonant coupling of a Tamm state to a Fabry-Perot resonance in slits periodically pierced in a metal film. This new hybrid resonance exists at the interface between a dielectric Bragg mirror and a subwavelength metal grating. Contrary to a classic Tamm plasmon, it is sensitive to the ambient media refractive index due to its confinement inside the grating slits. The proposed sensor output can be either the reflected intensity or preferably the wavelength, and its sensitivity and figure of merit are numerically investigated with the help of rigorous coupled wave analysis. The sensitivity of the studied sensor is 87 nm/RIU for a refractive index range from 1.25 to 1.38, and, at the expense of the resolution, it can reach up to 160 nm/RIU for a grating duty cycle of 50%. The figure of merit is around ${{7.5}}\;{{\rm{RIU}}^{- 1}}$ with a large measuring range. The index sensor performances and operating resonance wavelength can be modified by adjusting the grating geometric parameters (height and duty cycle). The possibility to achieve wavelength modulation in any spectral range makes the proposed grating Tamm structure an attractive candidate to design refractive index sensors and photonic components in the infrared and terahertz domains.