The self-assembly of block copolymers (BCPs) has attracted considerable attention because it can effectively generate highly ordered nanostructures through a simple and cost-effective process. However, in BCP annealing systems, there remain several challenges and issues that must be resolved to achieve more rapid and tunable pattern formation of BCPs with a high Flory–Huggins parameter (χ) for next-generation lithography applications. Here, we introduce a useful annealing technique to induce a rapid morphological transition of sphere-forming poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs by employing multistep solvent vapor annealing (MSVA) and a combined annealing process of solvent vapor annealing (SVA) and immersion annealing (IA). We successfully obtained well-ordered sub-20 nm line, dot, core–shell dot, and core–shell line structures with a short annealing time (<25 min) based on the synergetic effects of the combined annealing method which provides both the fast self-assembly kinetics and a wide range of pattern geometries. Furthermore, we demonstrate how the repeated process of SVA and IA affects the morphological stability of self-assembled BCPs, showing highly ordered solid and core–shell BCP nanostructures even after ten cycles of the repeated annealing process. We expect that these results will provide a new guideline to manipulate diverse BCP nanostructures effectively for nanodevice fabrication by combining various annealing methods.
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