For CZTS(e) solar cells, the passivation of interfacial defects is crucial for effectively reducing carrier recombination at the interface. This study examined the combined impact of plasma etching and surface sulfuration on the passivation of interface defects in CZTSSe thin films. The results indicated that plasma etching could improve the surface quality of the thin films and passivate surface defects. The (NH4)2S vapor had a significant sulfuration effect on the surface of the CZTSSe thin films post-etching. The surface defects of the CZTSSe film were passivated by the sulfur element entering the film by sulfuration. Moreover, the bandgap of the CZTSSe thin films was improved. The efficiency of the solar cell device increased by 1.72 % with a plasma etching duration of 5 min and (NH4)2S vaporization treatment of 15 min. This study proposes a novel approach that employs surface passivation techniques to enhance the efficiency of CZTSSe thin film solar cells.