Crystal Nickel Films Research Articles

Mechanical characterization of single crystal silicon and UV-LIGA nickel thin films using tensile tester operated in AFM

This paper describes the mechanical characteristics of microscale single crystal silicon (SCS) and UV-LIGA nickel (Ni) films used for microelectromechanical systems (MEMS). A compact tensile tester, operated in an atomic force microscope (AFM), was developed for accurate evaluation of Young's modulus, tensile strain and tensile strength of microscale SCS and UV-LIGA Ni specimens. SCS specimens with nominal dimensions of 20 μm in thickness, 50 μm in width and 600 μm in length were prepared by a conventional photolithography and etching process. UV-LIGA Ni specimens, with a thickness of 15 μm, a width of 50 μm and a length of 600 μm in nominal dimensions, were also fabricated by electroplating using a UV thick photoresist mould. All specimens have line patterns on their specimen gauge section to measure axial elongation under tensile loading. The SCS specimens showed a linear stress–strain response and fractured in a brittle manner, whereas the UV-LIGA Ni specimens showed elastic–inelastic deformation behaviour. Young's modulus of SCS and UV-LIGA Ni specimens obtained from tensile tests averaged 169.2 GPa and 183.6 GPa, respectively, close to those of bulk materials. However, the tensile strength of both materials showed a larger value than the bulk materials: 1.47 GPa for the SCS and 0.98 GPa for the Ni specimens. Yield stress and breaking elongation of UV-LIGA Ni specimens were also quite different from those of the bulk Ni because of the specimen size effect on inelastic properties.

Nucleation and Growth of Ultrathin Epitaxial Metal Silicides on Silicon

ABSTRACTGrowth of epitaxial single crystal nickel and cobalt disilicide films on silicon is performed under UHV conditions by deposition of Co or Ni on silicon followed by a high temperature reaction to form the silicide. The uniformity and perfection of ultrathin epitaxial layers has been studied using transmission electron microscopy. Mechanisms controlling island growth are discussed. Island nucleation observed in pseudomorphic films of NiSi2 /Si(100) (∼60Å thick) is shown to be the result of the difference in symmetry between the NiSi2 and Si. Islands related by a translation vector a/4<111> show an equilibrium island separation of 15±1.5Å. The boundary between islands is described as a coreless defect. In comparison,, pseudomorphic layers of CoSi2 /Si(111) are observed up to thicknesses ∼30Å. Pinholes are commonly observed in CoSi2 /Si(111) thin films. Finite contact angles (∼50) between substrate and deposit suggest a desire for three-dimensional growth under equilibrium conditions.