Structural properties of InN films grown on (0001) sapphire by radio frequency molecular beam epitaxy were characterized using transmission electron microscopy. A high density of threading dislocations was observed in the InN films. The density of the dislocation was more than 2 × 1010 cm−2. Most threading dislocations were edge-type dislocations. A columnar structure of crystallites with a small angular distribution in the c-plane (twist) was clearly observed. X-ray rocking curve measurements showed that InN film had relatively large distribution of twist in contrast to that of tilt. Convergent beam electron diffraction method was used to determine the polarity of the InN film. It is found that the InN film grown on the sapphire (0001) substrate showed N-polarity. (© 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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