In the n + pn − n + transistor, high-current effects in the base and collector regions are linked within the current ranges of practical interest. To describe such effects, we have derived an analytical model that is based primarily on five assumptions: (1) the structure is approximately one-dimensional; (2) recombination is negligible in the base and collector quasi-neutral regions, and in the three space-charge regions; (3) high-current effects are negligible in the emitter and n +-substrate regions; (4) the Fletcher boundary conditions (or the Misawa boundary conditions) can be used for the three space-charge regions; and (5) the ambipolar approach can be used for the base and collector quasi-neutral regions. The primary findings predicted by the n + pn − n + transistor model are: In current ranges of practical interest (usable current gain), the electron concentration profile has a significant “vertical step” located at the collector-base metallurgical junction for all values of collector current. In the limit of extremely-high-current operation, this step tends to vanish. In the current range where the current gain begins to decline rapidly with increasing collector current, the electron concentration at the base boundary of the collector-base space-charge region goes approximately as the square of the hole concentration at the collector boundary of the same region. Because of this relationship, a charge-control calculation is more difficult than a straightforward calculation of carrier concentration for a given degree of accuracy. The n + pn − n + transistor model (which consists of twelve algebraic equations) is particularly useful for the practically important case of an epitaxial bipolar transistor having a very thin, heavily-doped base region.
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