Photoelectrochemical cells (PECs) for water splitting typically rely on catalysts deposited on the semiconductor due to its lack of intrinsic electrocatalytic activity. However, the placement of catalysts within the light path between the source and semiconductor in artificial leaf-based architectures can hinder the semiconductor's light absorption, diminishing photoelectrochemical activity, especially at high catalyst loading. To address this challenge, we propose a strategy involving the controlled formation of patterned catalysts on the semiconductor surface. This approach, utilizing light-guided electrodeposition facilitated by a digital micromirror device (DMD), enables the direct, localized deposition of transition metal-based catalysts. The resulting patterned catalysts correspond to the light pattern, allowing for optimized photoelectrochemical performance. We demonstrate the efficacy of this strategy on a hematite (α-Fe2O3)-based photoanode, achieving enhanced performance with grid-patterned CoPi catalysts. This approach not only facilitates high catalyst loading but also ensures sufficient light penetration through the exposed intrinsic surface of α-Fe2O3. Our findings suggest that this technique holds promise for advancing the commercialization of PECs, particularly for self-biased water splitting devices aimed at green H2 production.
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