Lithium tantalate (LiTaO3) thin films of varying thicknesses were deposited using RF magnetron sputtering for applications in electrochromic devices. The microstructural, optical and electrical properties of the films were systematically investigated. Microstructural analysis revealed that with increasing LiTaO3 films thickness, more island particles appeared and distributed densely and uniformly. Micro-cracks formed owing to the increased internal stress and the surface roughness increased significantly. LiTaO3 films exhibited high transmittance in the visible spectral range but showed significant absorption at wavelengths below 300 nm. The increasing LiTaO3 films thickness resulted in higher resistance and lower leakage current. Inorganic all solid electrochromic devices were fabricated using LiTaO3 film as the ion conductor layer. The charge capacity (ΔQ) decreased with increasing LiTaO3 film thickness, primarily due to Li+ transfer at the interface. Adjusting the deposition sequence of the of WO3 and NiO layer effectively mitigated the loose fiber-like structures and cavities in WO3. The presence of island-like particles and increased surface roughness introduced higher interfacial impedance and charge transfer resistance, further hindering Li+ transport. These factors resulted in irreversible Li+ insertion/extraction processes, ultimately degrading the electrochromic performance.
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