In this work, the room-temperature dual gas sensing characteristics of indium oxide (In2O3) thin films towards NO2 and H2S have been studied. In2O3 thin films were synthesized by the thermal oxidation of indium metal films of various thicknesses in the range of 50–250 nm deposited by thermal evaporation method. Grazing incidence X-ray diffraction (GI-XRD) revealed the change in preferred orientation of In2O3 thin films corresponding to varying thickness, while field-emission electron microscopy studies showcased evolving surface morphologies from individual grains to granular network with respect to the increase in film thickness. Investigations were made on the ability of In2O3 thin films to detect various low concentrations of nitrogen dioxide (NO2) and hydrogen sulfide (H2S) gases at ambient temperature. In2O3 thin films synthesized using 100 nm thick In films exhibited good sensing response of around 58 and 68 % towards NO2 and H2S gases of 5 ppm respectively, at room temperature (27 °C) with the response time of 36 and 18 s. Remarkably, the lower experimental detection limit of these toxic gases could be extended up to 100 ppb. Using X-ray photoelectron spectroscopy, a large presence of surface oxygen is observed on the In2O3 thin film. The sensor has demonstrated remarkable sensing abilities, including strong selectivity, quick sensing response, and good repeatability.
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