Block Copolymer Thin Films Research Articles

Direct Visualization of the Self-Alignment Process for Nanostructured Block Copolymer Thin Films by Transmission Electron Microscopy

Herein, this work aims to directly visualize the morphological evolution of the controlled self-assembly of star-block polystyrene-block-polydimethylsiloxane (PS-b-PDMS) thin films via in situ transmission electron microscopy (TEM) observations. With an environmental chip, possessing a built-in metal wire-based microheater fabricated by the microelectromechanical system (MEMS) technique, in situ TEM observations can be conducted under low-dose conditions to investigate the development of film-spanning perpendicular cylinders in the block copolymer (BCP) thin films via a self-alignment process. Owing to the free-standing condition, a symmetric condition of the BCP thin films can be formed for thermal annealing under vacuum with neutral air surface, whereas an asymmetric condition can be formed by an air plasma treatment on one side of the thin film that creates an end-capped neutral layer. A systematic comparison of the time-resolved self-alignment process in the symmetric and asymmetric conditions can be carried out, giving comprehensive insights for the self-alignment process via the nucleation and growth mechanism.

Selective solvent vapor induced self-assembly of silicon-containing bottlebrush block copolymer thin films to generate mesoporous silicon oxide patterns

Bottlebrush block copolymers (BBCPs) are intriguing architectures that can produce various anisotropic nanostructures dictated by the composition, length of the backbone and the lengths of side-chains. Here, we develop a facial approach toward ordered inorganic silicon oxide patterns and particles on substrates by solvent vapor induced thin film self-assembly of anisotropic bottlebrush block copolymers (BBCP) containing polydimethylsiloxane (PDMS) and polystyrene (PS) side chains. The in-plane cylindrical or stripes-like, spherical, and ordered porous morphologies as well as Janus particles-like morphology were fabricated on the substrate through solvent vapor annealing (SVA). The Janus particle-like morphology consisting of PS heads inserted in PDMS heads were directed to produce meso-to macroporous silicon oxide bowls after oxygen plasma etching. The effects of the solvent vapor on the molecular geometry and morphology of the BBCPs were described, and the influence of the backbone length on the self-assembly behavior of the thin film were discussed. This work demonstrates that silicon-containing BBCPs with a native etch contrast and a large difference in solubility parameters are potential candidates to generate ordered silicon oxide templates of different geometries with periodicity 80–150 nm providing access to length scales larger than linear block copolymers.

Trilayered Block Copolymer Nanostructures Formed by an Iterative Layering Strategy

AbstractNanostructured block copolymer (BCP) thin films enable the formation on‐demand of a variety of periodic patterns at the nanometer scale by tuning the macromolecular BCP characteristics and annealing processes. Significant progress in the control of the self‐assembly has been witnessed over the past decade with the implementation of robust directed self‐assembly methods. However, the self‐assembled structural patterns obtained at equilibrium are limited and methods to expand the range of structural configurations are required to harness additional functionalities. Here, this work demonstrates how polystyrene‐b‐poly(methyl methacrylate) BCP thin layers can be stacked to produce a library of complex 3D hierarchical heterostructures. In this iterative assembly process based on simple building bricks (i.e., immobilized BCP patterns forming Holes, Lines and Dots), the stacking configuration (i.e., self‐assembly and registration) of a BCP thin film is directed with respect to the previous layer using confinement effects and interfacial energy tuning. This responsive layering can lead to intricate 3D Al2O3 structures and opens the way to a broad variety of structural designs toward functional applications.

Self-assembled biodegradable block copolymer precursors for the generation of nanoporous poly(trimethylene carbonate) thin films

Even though the domain of nanoporous template manufacturing from self-assembled block copolymers is in full expansion, challenging studies addressing innovative biodegradable block copolymer assemblies are still not reported. Herein, we address the usage of an original biodegradable precursor to prepare nanoporous thin films: the PTMC-b-PDLLA-b-PTMC triblock copolymer. The copolymer is designed to have a favorable interaction parameter for phase-separation, which was confirmed by differential scanning calorimetry by the appearance of two distinctive glass transition temperatures, corresponding to each of the blocks. Thin films are firstly produced by spin-coating and two methods are investigated for achieving organized self-assembly of the system: solvent evaporation and solvent vapor annealing. Well-organized bicontinuous nanoscopic phase-separated morphologies consisting of PTMC and PDLLA domains are achieved under precise solvent vapor annealing conditions for a particular triblock copolymer composition. Triblock copolymer self-assembly is compared to the one occurring in PTMC/PDLLA blends where no ordered phase-separation is observed. Moreover, thin films photo-crosslinking of previously methacrylated PTMC end-blocks, beneficial to the stability and cohesion of the PTMC phase, as well as mechanical strength of the porous matrix, proved to preserve the phase separation. From the optimal oriented block copolymer thin films, selective etching via PDLLA mild hydrolysis resulted in nanoporous PTMC with maintained long-range order and stability. Such approach to generate nanoporous PTMC could have great potential in both biomedical applications and the energy field.

Spatiotemporal Mapping of Hole Nucleation and Growth during Block Copolymer Terracing with High-Speed Atomic Force Microscopy.

As a platform for investigating two-dimensional phase separation, we track the structural evolution of block copolymer thin films during thermal annealing with environmentally controlled atomic force microscopy (AFM). Upon thermal annealing, block copolymer films with incommensurate thickness separate into a terraced morphology decorated with holes. With in situ imaging at 200 °C, we follow the continuous progression of terrace formation in a single region of a cylinder-forming poly(styrene-block-methyl methacrylate) thin film, beginning with the disordered morphology on an unpatterned silicon substrate and continuing through nucleation and coarsening stages. Topographic AFM imaging with nanoscale resolution simultaneously captures ensemble hole growth statistics while locally tracking polymer diffusion through measurements of the film thickness. At early times, we observe homogeneous hole nucleation and isotropic growth, with kinetics following the predictions of classical nucleation theory. At later times, however, we find anomalous hole growth which arises due to the combination of Ostwald ripening and coalescence mechanisms. In each case, our real-space observations highlight the importance of hole interactions for determining coarsening kinetics, mediated either through the interconnected phase for Ostwald ripening or through binary collision events for coalescence.

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement.

Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control. It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by the width of the plateaus becomes a critical factor influencing the local morphology.

Processive Pathways to Metastability in Block Copolymer Thin Films.

Block copolymers (BCPs) self-assemble into intricate nanostructures that enhance a multitude of advanced applications in semiconductor processing, membrane science, nanopatterned coatings, nanocomposites, and battery research. Kinetics and thermodynamics of self-assembly are crucial considerations in controlling the nanostructure of BCP thin films. The equilibrium structure is governed by a molecular architecture and the chemistry of its repeat units. An enormous library of materials has been synthesized and they naturally produce a rich equilibrium phase diagram. Non-equilibrium phases could potentially broaden the structural diversity of BCPs and relax the synthetic burden of creating new molecules. Furthermore, the reliance on synthesis could be complicated by the scalability and the materials compatibility. Non-equilibrium phases in BCPs, however, are less explored, likely due to the challenges in stabilizing the metastable structures. Over the past few decades, a variety of processing techniques were introduced that influence the phase transformation of BCPs to achieve a wide range of morphologies. Nonetheless, there is a knowledge gap on how different processive pathways can induce and control the non-equilibrium phases in BCP thin films. In this review, we focus on different solvent-induced and thermally induced processive pathways, and their potential to control the non-equilibrium phases with regards to their unique aspects and advantages. Furthermore, we elucidate the limitations of these pathways and discuss the potential avenues for future investigations.

Controlled Orientation of Silicon-Containing Diblock Copolymer Thin Films by Substrate Functionalization Under Vacuum

This work demonstrates a simple approach to control the orientation of the self-assembled nanostructured block copolymer thin films of polystyrene-block-polydimethylsiloxane (PS-b-PDMS) by functionalization of the oxide layer (SiO2) on the Si substrate followed by thermal annealing under low-pressure environmental conditions. The substrate can be functionalized through two-step grafting of hydroxy-terminated polystyrene brush (PS–OH brush) followed by hydroxy-terminated polydimethylsiloxane brush (PDMS–OH brush) onto the wafer substrate. By controlling the grafting ratio of PS–OH and PDMS–OH brushes, the affinities of the PS and PDMS blocks with the substrates can be fine-tuned to provide a neutral substrate in order to form perpendicular cylinders from the bottom after thermal annealing. Owing to the vacuum-driven orientation [i.e., thermal annealing under low-pressure environment conditions (∼10–4 Pa)], the orientation of the cylinders can be controlled at the air/polymer interface. Interestingly, by combining the vacuum-driven approach with substrate functionalization, perpendicular cylinders from the air/polymer interface and substrate/polymer interface can be generated, respectively. Consequently, well-aligned perpendicular cylinders with long-range ordering can be fabricated by the self-alignment process.

Orthogonal electric and ionic conductivities in the thin film of a thiophene–thiophene block copolymer

Orthogonal electric and ionic conductivities were measured in thiophene–thiophene block copolymer thin films with different side chain functionalities.

Catalytic assembly of symmetric diblock copolymers in a thin film: a dissipative particle dynamics simulation study.

Obtaining a thin block copolymer film with a perfect structure by self-assembly is difficult because the system is, in general, trapped in a metastable state. We used dissipative particle dynamics (DPD) to investigate the self-assembly of AB symmetric diblock copolymers in a thin film. We discovered that addition of a small molecule (molecule C) as the third composition could help the system evade the metastable state. Therefore, imperfect structures could be corrected, and ordered structures formed. Analogous to the performance of a catalyst in catalytic chemistry, molecule C could promote assembly into an ordered structure, but was less involved within the polymer phase. Moreover, simulation results showed that the content of molecule C and its repulsive interactions with blocks A and B were quite important for promoting assembly into ordered structures effectively.

Failure and Mechanical Properties of Glassy Diblock Copolymer Thin Films

Block copolymer self-assembly is affected by nanoscale confinement, which has long been known to affect interchain entanglements and dynamics of polymers. While most previous work on confined polymer glasses has focused on the properties of homopolymers, the mechanical response of glassy block copolymer thin films is still relatively unexplored. By uniaxially deforming glassy lamellar diblock copolymer films with different morphologies via molecular dynamic simulations, we demonstrate that the toughness of the films with fingerprint morphologies is higher compared to homopolymers and oriented lamellar films due to the increase in the randomness of domain orientations and entanglements. We show that the thickness impact on the mechanical properties of the block copolymers is not as big as that of the homopolymer systems. In the strain localization analysis of the block copolymer films, there are the plastic rearrangements initially clustered at the boundary between the two phases of the lamellae until close to failure when the plasticity transitions to the center of a domain. In the block copolymer systems, crazes in the thinnest films exhibit distinct behaviors compared to thicker films. Our studies of the film mechanics provide molecular insights into how segmental mobility and entanglements interplay with position and morphology to control the mechanics of thin polymer films.

Competitive Registration Fields for The Development of Complex Block Copolymer Structures by A Layer-by-Layer Approach.

Block copolymer (BCP) self-assembly in thin films is an elegant method to generate nanometric features with tunable geometrical configurations. By combining directed assembly and hybridization methods, advances in nano-manufacturing have been attested over the past decades with flagship applications in lithography and optics. Nevertheless, the range of geometrical configurations is limited by the accessible morphologies inherent to the energy minimization process involved in BCP self-assembly. Layering of nanostructured BCP thin films has been recently proposed in order to enrich the span of nanostructures derived from BCP self-assembly with the formation of non-native heterostructures such as double-layered arrays of nanowires or dots-on-line and dots-in-hole hierarchical structures. In this work, the layer-by-layer method is further exploited for the generation of nano-mesh arrays using nanostructured BCP thin films. In particular, a subtle combination of chemical and topographical fields is leveraged in order to demonstrate design rules for the controlled registration of a BCP layer on top of an underneath immobilized one by the precise tuning of the interfacial chemical field between the two BCP layers.

Orientation control of the hexagonal and lamellar phases in thin block copolymer films using in-plane AC electric field

Lamellar and hexagonal pattern rearrangements in thin films of polystyrene–block–poly(2-vinyl pyridine) and polystyrene–block–poly(4-vinyl pyridine) copolymers simultaneously exposed to an in-plane AC electric field and saturated chloroform vapor are studied with atomic force microscopy and analyzed via the numerical solution of the self-consistent field theory equations. It is demonstrated that the use of AC field with the root-mean-square strength higher than 8 V⋅μm−1 allows one to effectively orient microphase-separated domains along the field direction on the tens of microns scale. At the same time, the AC field considerably lowers the risk of breakdown and eliminates effects related to ionic transport in the presence of solvent vapor. The role of such factors as the exposure time, field strength and frequency is investigated. Theoretical considerations prove the equivalent effect of AC and DC fields on the structure of the copolymer film in a wide frequency range. Self-consistent field theory calculations of the free energy as a function of film thickness make it possible to exactly identify which phase dominates in the film. In particular, an apparent transformation of standing cylinders into long threads aligned in the field direction should be interpreted as the phase transition from the perpendicular to parallel hexagonal phase, which can take place in a certain range of film thicknesses, provided the electric field strength exceeds a certain threshold value. In the case of a perpendicular lamellar phase, the domain orientation along the direction of the electric field is always profitable. The observed morphological rearrangements under an in-plane field, which preserve connectivity between the film surfaces through the domains of the minor copolymer block, can be important for practical applications.

Chain Redistribution Stabilizes Coexistence Phases in Block Copolymer Blends.

The nanoscale morphologies of block copolymer (BCP) thin films are determined by chain architecture. Experimental studies of thin film blends of different BCP chain types have demonstrated that blending can stabilize new motifs, such as coexistence phases. Here, we deploy coarse-grained molecular dynamics (MD) simulations in order to better understand the self-assembly behavior of BCP blend thin films. We consider blends of lamella- and cylinder-forming BCP chains, studying their morphological makeup, the chain distribution within the morphology, and the underlying polymer chain conformations. Our simulations show that there are local concentration deviations at the scale of the morphological objects that dictate the local structure, and that BCP chains redistribute within the morphology so as to stabilize the structure. Underlying these effects are measurable distortions in the BCP chain conformations. The conformational freedom afforded by BCP blending stabilizes defects and allows coexistence phases to appear, while also leading to kinetic trapping effects. These results highlight the power of blending in designing the morphology that forms.

Enhanced catalytic reduction/degradation of organic pollutants and antimicrobial activity with metallic nanoparticles immobilized on copolymer modified with NaY zeolite films

Toxic organic pollutants are the major cause of water pollution. Thus, finding a reliable technology for the removal of such pollutants is one of the global priorities for the protection of the natural environment and human health. The MNP’s with low-cost and high catalytic efficiency loaded on self-assembled polymeric membranes are promising approach to treat waste water because of their outstanding properties. In this work, novel polystyrene-b-polyisoprene-b-polystyrene block copolymer (BP) virgin and modified composites with NaY zeolite (BP-NaY) were successfully prepared via a simple solution casting method for immobilization of the metal nanoparticles (MNPs). Both the films were impregnated with zero-valent Cu, Ag and CuAg nanoparticles (NPs). The synthesized catalysts were analyzed through FESEM, EDS, FTIR and XRD. The impregnated metal ions on BP or BP-NaY nanocomposites thin films were converted to their corresponding zero-valent metal NPs by using NaBH4 as a reductant and were evaluated for their catalytic activity in the reduction of various organic pollutants including dyes (MO, CR, MB, ARS), nitroarenes (4-NP, 4-NA, 2/3/4-NB) and antibiotic cefixime. Based on pseudo-first-order kinetics, the rate constant value “kapp” was highest for [email protected] catalyst against all pollutants i.e. 14.7 × 10−1, 40.6 × 10−1, 17.5 × 10−1, 11.6 × 10−1, 12.7 × 10−1, 6.4 × 10−1, 13.2 × 10−1 min−1 for 4-NP, 4-NA, MO, ARS, MB, CR and cefixime respectively. The effect of various parameters on pollutants removal and concurrent degradation of dyes and nitroarenes were also investigated. Catalyst proved to be stable as a slight reduction in the catalyst activity was observed during recyclability. Moreover, the [email protected] showed 19- and 22-mm zone of inhibition against Escheria coli and Staphylococcus aureus respectively. Thus, this study highlighted the catalytic potential of the prepared MNPs in water treatment applications.

Vacuum-Driven Orientation of Nanostructured Diblock Copolymer Thin Films.

This work aims to demonstrate a facile method for the controlled orientation of nanostructures of block copolymer (BCP) thin films. A simple diblock copolymer system, polystyrene-block-polydimethylsiloxane (PS-b-PDMS), is chosen to demonstrate vacuum-driven orientation for solving the notorious low-surface-energy problem of silicon-based BCP nanopatterning. By taking advantage of the pressure dependence of the surface tension of polymeric materials, a neutral air surface for the PS-b-PDMS thin film can be formed under a high vacuum degree (∼10-4 Pa), allowing the formation of the film-spanning perpendicular cylinders and lamellae upon thermal annealing. In contrast to perpendicular lamellae, a long-range lateral order for forming perpendicular cylinders can be efficiently achieved through the self-alignment mechanism for induced ordering from the top and bottom of the free-standing thin film.

(Invited) Vapor-Phase Infiltration for Microelectronics Applications

Vapor-phase infiltration (VPI) is an emerging organic-inorganic materials hybridization technique derived from atomic layer deposition (ALD) wherein gaseous organometallic precursors and co-reactants diffuse into starting organic templates in a sequential and cyclic manner and become hybridized with the organic matrix. The resulting hybrids feature uniquely enhanced materials properties, including but not limited to mechanical, chemical, dielectric, optical, and electrical properties, which are controllable by the type and amount of infiltrated inorganic species. When combined with polymer templates with either dimensional confinement (e.g., lithographically defined polymer patterns) or intrinsic spatial chemical contrast (e.g., self-assembled block copolymer (BCP) thin films), the technique also yields a site-specific infiltration, analogous to area-selective ALD, creating a spatially localized hybridization. Furthermore, the organic matrix of such infiltrated hybrids can be selectively removed by plasma ashing and thermal annealing to generate inorganic nanostructures that inherit the morphology of starting polymer templates, providing an alternative inorganic nanopatterning methodology. In this talk, I will showcase how these features of VPI can be utilized for the applications in microelectronics, including: (a) arbitrary patterning ultrahigh aspect-ratio metal oxide nanostructures; (b) generation of metal-oxide-based nanowire and nanomesh structures for conductometric sensing; and (c) VPI-derived metal-oxide-infiltrated hybrid photoresists for extreme ultraviolet (EUV) lithography.

Al2O3 Dot and Antidot Array Synthesis in Hexagonally Packed Poly(styrene-block-methyl methacrylate) Nanometer-Thick Films for Nanostructure Fabrication.

Nanostructured organic templates originating from self-assembled block copolymers (BCPs) can be converted into inorganic nanostructures by sequential infiltration synthesis (SIS). This capability is particularly relevant within the framework of advanced lithographic applications because of the exploitation of the BCP-based nanostructures as hard masks. In this work, Al2O3 dot and antidot arrays were synthesized by sequential infiltration of trimethylaluminum and water precursors into perpendicularly oriented cylinder-forming poly(styrene-block-methyl methacrylate) (PS-b-PMMA) BCP thin films. The mechanism governing the effective incorporation of Al2O3 into the PMMA component of the BCP thin films was investigated evaluating the evolution of the lateral and vertical dimensions of Al2O3 dot and antidot arrays as a function of the SIS cycle number. The not-reactive PS component and the PS/PMMA interface in self-assembled PS-b-PMMA thin films result in additional paths for diffusion and supplementary surfaces for sorption of precursor molecules, respectively. Thus, the mass uptake of Al2O3 into the PMMA block of self-assembled PS-b-PMMA thin films is higher than that in pure PMMA thin films.

Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate.

Open pore mesoporous silica (MPS) thin films and channels were prepared on a substrate surface. The pore dimension, thickness and ordering of the MPS thin films were controlled by using different concentrations of the precursor and molecular weight of the pluronics. Spectroscopic and microscopic techniques were utilized to determine the alignment and ordering of the pores. Further, MPS channels on a substrate surface were fabricated using commercial available lithographic etch masks followed by an inductively coupled plasma (ICP) etch. Attempts were made to shrink the channel dimension by using a block copolymer (BCP) hard mask methodology. In this regard, polystyrene-b-poly(ethylene oxide) (PS-b-PEO) block copolymer (BCP) thin film forming perpendicularly oriented PEO cylinders in a PS matrix after microphase separation through solvent annealing was used as a structural template. An insitu hard mask methodology was applied which selectively incorporate the metal ions into the PEO microdomains followed by UV/Ozone treatment to generate the iron oxide hard mask nanopatterns. The aspect ratio of the MPS nanochannels can be varied by altering etching time without altering their shape. The MPS nanochannels exhibited good coverage across the entire substrate and allowed direct access to the pore structures.

Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns.

Nanopatterning for the fabrication of optical metasurfaces entails a need for high-resolution approaches like electron beam lithography that cannot be readily scaled beyond prototyping demonstrations. Block copolymer thin film self-assembly offers an attractive alternative for producing periodic nanopatterns across large areas, yet the pattern feature sizes are fixed by the polymer molecular weight and composition. Here, a general strategy is reported which overcomes the limitation of the fixed feature size by treating the copolymer thin film as a hierarchical resist, in which the nanoscale pattern motif is defined by self-assembly. Feature sizes can then be tuned by thermal reflow controlled locally by irradiative cross-linking or chemical alteration using lithographic ultraviolet light or electron beam exposure. Using blends of polystyrene-block-poly(methylmethacrylate) (PS-b-PMMA) with PS and PMMA homopolymers, we demonstrate both self-assembled PS grating and hexagonal hole patterns; exposure-controlled reflow is then used to reduce the hole diameter by as much as 50% or increase the PS grating linewidth by more than 180%. Transferring these nanopatterns, or their inverse obtained by a lift-off approach, into silicon yields structural colors that may be prescriptively controlled based on the nanoscale feature size. Furthermore, patterned exposure enables area-selective feature size control, yielding uniform structural color patterns across centimeter square areas. Electron beam lithography is also used to show that the lithographic resolution of this selective-area control can be extended to the nanoscale dimensions of the self-assembled features. The exposure-controlled reflow approach demonstrated here takes a pivotal step toward fabricating complex, hierarchical optical metasurfaces using scalable self-assembly methods.