The fine control of antisite defects for Bi2Te3-based materials is necessary to improve their thermoelectric performance using the optimization of a carrier concentration. In this work, we attempted to tune the n-type carrier concentration by forming antisite TeBi defects under a Te-rich condition for Cu0.01Bi2Te2.3+xSe0.7 samples (0 ≤ x ≤ 0.7). The electrical resistivity decreases with increasing the amount of excess Te in the sample of Cu0.01Bi2Te2.3+xSe0.7, which is originated from the increase in the electron carrier concentration for the Te-excess samples. The highest power factor of 2.72 mW/m K2 is obtained at 323 K for Cu0.01Bi2Te2.4Se0.7, which is enhanced by ~ 20% compared to the x = 0 sample. The highest ZT of 0.92 is achieved at 473 K for Cu0.01Bi2Te2.4Se0.7, which is 11% higher than that of x = 0 sample (ZT = 0.83). We demonstrate that the optimization of n-type carrier concentration by forming antisite TeBi defects in n-type Bi2Te3-based materials should be effective for enhancing their thermoelectric performance.
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