AlGaN-based Deep-ultraviolet Light-emitting Diodes Research Articles

High Hole Injection for Nitrogen-Polarity AlGaN-Based Deep-Ultraviolet Light-Emitting Diodes

High hole injection is desired for improving the performance of AlGaN-based deep-ultraviolet (DUV) light-emitting diodes (LEDs). In this work, we adopted a compositionally graded p-Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">y1</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1-y1</sub> N/Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.85</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.15</sub> N superlattice (SL) structure in a nitrogen-polarity DUV LED. Our numerical simulation results show that this SL structure is very beneficial to the hole injection into the active region, and leads to a low turn-on voltage and device resistance. This is significant because a low device resistance means a low power consumption and a high wall-plug efficiency. Meanwhile, a DUV LED with compositionally graded SL has a peak internal quantum efficiency (72%) that is much higher than that of the reference DUV LED without an SL (56%). This work provides an attractive approach to effectively injecting holes into the active region of a nitrogen-polarity AlGaN-based DUV LED.

Plasmonic-enhanced efficiency of AlGaN-based deep ultraviolet LED by graphene/Al nanoparticles/graphene hybrid structure.

The AlGaN-based deep ultraviolet light-emitting diode (DUV LED) has advantages of environmentally friendly materials, tunable emission wavelength, and easy miniaturization. However, the light extraction efficiency (LEE) of an AlGaN-based DUV LED is low, which hinders its applications. Here, we design a graphene/Al nanoparticles/graphene (Gra/Al NPs/Gra) hybrid plasmonic structure, where the strong resonant coupling of local surface plasmons (LSPs) induces a 2.9-times enhancement for the LEE of the DUV LED according to the photoluminescence (PL). The dewetting of Al NPs on a graphene layer by annealing is optimized, resulting in better formation and uniform distribution. The near-field coupling of Gra/Al NPs/Gra is enhanced via charge transfer among graphene and Al NPs. In addition, the skin depth increment results in more excitons being coupled out of multiple quantum wells (MQWs). An enhanced mechanism is proposed, revealing that the Gra/metal NPs/Gra offers a reliable strategy for improving the optoelectronic device performance, which might trigger the advances of LEDs and lasers with high brightness and power density.

Optical power degradation mechanisms in 271 nm AlGaN-based deep ultraviolet light-emitting diodes.

The degradation of AlGaN-based UVC LEDs under constant temperature and constant current stress for up to 500 hrs was analyzed in this work. During each degradation stage, the two-dimensional (2D) thermal distributions, I-V curves, optical powers, combining with focused ion beam and scanning electron microscope (FIB/SEM), were thoroughly tested and analyzed the properties and failure mechanisms of UVC LEDs. The results show that: 1) the opto-electrical characteristics measured before/during stress indicate that the increased leakage current and the generation of stress-induced defects increase the non-radiative recombination in the early stress stage, resulting in a decrease in optical power; 2) the increase of temperature caused by the deterioration of the Cr/Al layer of p-metal after 48 hrs of stress aggravates the optical power in UVC LEDs. The 2D thermal distribution in conjunction with FIB/SEM provide a fast and visual way to precisely locate and analyze the failure mechanisms of UVC LEDs.

Operation-induced degradation mechanisms of 275-nm-band AlGaN-based deep-ultraviolet light-emitting diodes fabricated on a sapphire substrate

Degradation mechanisms of 275-nm-band AlxGa1-xN multiple quantum well deep-ultraviolet light-emitting diodes fabricated on a (0001) sapphire substrate were investigated under hard operation conditions with the current of 350 mA and the junction temperature of 105 °C. The optical output power (Po) initially decreased by about 20% within the operating time less than 102 h and then gradually decreased to about 60% by 484 h. For elucidating the causes for the initial and subsequent degradations, complementary electrical, time-resolved photoluminescence (TRPL), and impurity characterizations were carried out making a connection with the energy band profiles. Because the degradation of the wells was less significant than the Po reduction, the initial degradation is attributed essentially to the decrease in carrier injection efficiency (ηinjection), not in internal quantum efficiency of the wells, most likely due to depassivation of initially H-passivated preexisting nonradiative recombination centers (NRCs) in a Mg-doped p-type Al0.85Ga0.15N electron blocking layer. The principal cause for the subsequent Po reduction until 484 h is attributed to further decrease in ηinjection due to the appearance of certain current bypasses in addition to continuous depassivation of the NRCs in p-type AlxGa1-xN layers. According to our database on the species of vacancy-type defects acting as NRCs in GaN and AlN, which have been identified using the combination of positron annihilation and TRPL measurements, vacancy clusters comprised of a cation vacancy (VIII) and nitrogen vacancies (VN), such as VIIIVN2∼4, are the most suspicious origins of the NRCs in Mg-doped p-type AlxGa1-xN layers.

Improved hole injection and carrier distribution in AlGaN deep-ultraviolet light-emitting diodes with bidirectional-staircase-barrier structure

High-efficiency 278 nm AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) adopting the bidirectional-staircase-barrier (BSB) structure have been investigated. The experimental results show that the maximum external quantum efficiency (EQE) and wall-plug efficiency (WPE) for the proposed BSB structure reach 8.47% and 7.01%, respectively. Furthermore, compared with the reference structure, showing a tremendous improvement of 32% and 31%, respectively. Numerical simulation results show that the BSB structure enhances the electron confinement of the quantum barriers (QBs) as well as improves the hole injection, resulting in a 170% increase in the hole concentration for the active region. Meanwhile, integrating a 2-nm-thick thin-strip-barrier on two QBs close to the p-side can modulate the energy band flatter, which facilitates hole migration and achieves a more uniform distribution of holes in the active region. The more uniform carrier distribution improves the radiative recombination rate of the BSB structure by 147% compared to the reference structure. Furthermore, the dramatic increase of the radiative recombination rate in the three quantum wells (QWs) close to the n-side proves that the BSB structure achieves more QWs to participate in effective radiative recombination, which significantly enhances the quantum efficiency of the DUV-LEDs.

In-depth insights into polarization-dependent light extraction mechanisms of AlGaN-based deep ultraviolet light-emitting diodes.

The AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs) dominated by transverse-magnetic (TM) polarized emission suffer from extremely poor light extraction efficiency (LEE) from their top surface, which severely limits the device performance. In this study, the underlying physics of polarization-dependent light extraction mechanisms of AlGaN-based DUV LEDs has been explored in depth via simple Monte Carlo ray-tracing simulations with Snell's law. It is especially worth noting that the structures of the p-type electron blocking layer (p-EBL) and multi-quantum wells (MQWs) have a significant impact on light extraction behavior, especially for TM-polarized emission. Thus, an artificial vertical escape channel (named GLRV) has been constructed to efficiently extract the TM-polarized light through the top surface, by adjusting the structures of the p-EBL, MQWs, sidewalls, and using the adverse total internal reflection in a positive manner. The results show that the enhancement times of the top-surface LEE is up to 18 for TM-polarized emission in the 300 × 300 µm2 chip comprising a single GLRV structure, and further increases to 25 by dividing this single GLRV structure into a 4 × 4 micro-GLRV array structure. This study provides a new perspective for understanding and modulating the extraction mechanisms of polarized light to overcome the inherently poor LEE for the TM-polarized light.

Research Progress of AlGaN-Based Deep Ultraviolet Light-Emitting Diodes

AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs) have great application prospects in sterilization, UV phototherapy, biological monitoring and other aspects. Due to their advantages of energy conservation, environmental protection and easy miniaturization realization, they have garnered much interest and been widely researched. However, compared with InGaN-based blue LEDs, the efficiency of AlGaN-based DUV LEDs is still very low. This paper first introduces the research background of DUV LEDs. Then, various methods to improve the efficiency of DUV LED devices are summarized from three aspects: internal quantum efficiency (IQE), light extraction efficiency (LEE) and wall-plug efficiency (WPE). Finally, the future development of efficient AlGaN-based DUV LEDs is proposed.

High Efficiency Deep Ultraviolet Light-Emitting Diodes With Polarity Inversion of Hole Injection Layer

In this work, we investigate the performance improvement of N-polar AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs) by the inversion of the hole injection layer from N-polar to Ga-polar. The influence of different inversion points on the performance and the energy band of DUV LED is systematically studied, and the principle of performance improvement of DUV LED is explained in detail through the analysis of the energy band. Furthermore, according to the simulation results and practical application, an appropriate inversion point is selected. Under the current of 120 mA, with polarity inversion of the hole injection layer, the light output power of the DUV LEDs increases from 21.34 mW to 29.71 mW, and the applied voltage reduces from 16.06 V to 9.63 V. The DUV LED with polarity inversion has a 132% increase in wall-plug efficiency (WPE) compared with the DUV LED which is totally along [000-1] direction. Therefore, polarity inversion is an effective way to achieve high-performance UV-LEDs.

Improving Light Extraction Efficiency of AlGaN-Based Deep Ultraviolet Light-Emitting Diodes by Combining Thinning p-AlGaN/p-GaN Layer With Ni/Au/Al High-Reflectivity Electrodes

Improving light extraction efficiency (LEE) of AlGaN-based deep-ultraviolet (DUV) light emitting diodes (LEDs) has been attempted by thinning the p-AlGaN/p-GaN layer and adopting Ni/Au/Al composite electrodes. It is found that the thin p-AlGaN/p-GaN layer can reduce the light absorption and the Ni/Au/Al electrodes achieve high reflectivity and Ohmic contact to ensure the enhancement of the light extraction and maintain fine electrical properties. By this approach, the maximum external quantum efficiency of the DUV-LEDs with optimized Ni/Au/Al reflective electrodes is increased by 40%, compared to that with conventional Ni/Au electrodes over the whole current range.

Transparent p-type layer with highly reflective Rh/Al p-type electrodes for improving the performance of AlGaN-based deep-ultraviolet light-emitting diodes

We attempt to improve the light extraction of AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) by introducing a highly transparent p-type layer together with reflective Rh/Al p-type electrodes. The p-GaN contact layer is thinned to balance the Ohmic contact and DUV light transmittance, which helps the Rh/Al p-type electrodes realize high reflection as well as good electrical performance. After optimization, the Rh/Al reflective p-type electrodes present reflectance of greater than 70% and specific contact resistivity of 3.75 × 10−4 Ω·cm2. Due to the improvement in the light extraction efficiency, the highest wall-plug efficiency of 278 nm DUV-LEDs is improved by 57% compared to the conventional configuration with Ni/Au as the p-type electrodes.

Introducing an n-type electron deceleration layer to enhance the luminous efficiency of AlGaN-based DUV-LEDs

The internal quantum efficiency (IQE) of conventional AlGaN-based deep-ultraviolet (DUV) light-emitting diodes (LEDs) is seriously limited by the poor and inhomogeneous carrier injection. The typical solution is to optimize the structure parameters of p-type region and active region. In this work, however, we try to address this issue by introducing an n-type electron deceleration layer (EDL) underneath multiple quantum wells (MQWs). On one hand, the electron deceleration layer helps to decrease the electron velocity and thus increase the electron capture rate. On the other hand, it can also reduce barrier heights in the band valence and thus enhance the hole transport in the multiple quantum wells. As a consequence, the concentrations of electrons and holes in the multiple quantum wells were significantly increased, resulting in the enhancement of radiative recombination. Compared to the conventional structure, the DUV-LED structure with an electron deceleration layer achieves a higher internal quantum efficiency, leading to a 39% improvement in the light output power. It is believed that performing energy-band engineering in n-type region has great application prospects for high-performance DUV-LEDs.

Enhanced light output from deep ultraviolet light-emitting diodes enabled by high-order modes on a photonic crystal surface.

The authors demonstrate the enhanced light output from 275-nm AlGaN-based deep ultraviolet (DUV) light-emitting diode (LED) structures via the in-plane modulation of shallow photonic crystal (PC) patterns that were fabricated on the p-AlGaN contact layer surface. The employed PC lattice constants are in the range of 270-780 nm, much larger than the fundamental Bragg order lattice constant (∼95 nm). As compared to the unpatterned sample, the intensity of the top (or bottom) emission can be enhanced by up to 331% (or 246%), attributed to the high-order coherent diffraction of the internal trapped light and also the Purcell enhancement of spontaneous emission. The findings in this Letter suggest an easier way for the realization of more energy-efficient DUV LEDs which offer the advantage of high emission for various applications in disinfection and sterilization.

The influences of AlGaN barrier epitaxy in multiple quantum wells on the optoelectrical properties of AlGaN-based deep ultra-violet light-emitting diodes.

The growth conditions of the AlGaN barrier in AlGaN/AlGaN deep ultra-violet (DUV) multiple quantum wells (MQWs) have crucial influences on the light output power of DUV light-emitting diodes (LEDs). The reduction of the AlGaN barrier growth rate improved the qualities of AlGaN/AlGaN MQWs, such as surface roughness and defects. The light output power enhancement could reach 83% when the AlGaN barrier growth rate was reduced from 900 nm h-1 to 200 nm h-1. In addition to the light output power enhancement, lowering the AlGaN barrier growth rate altered the far-field emission patterns of the DUV LEDs and increased the degree of polarization in the DUV LEDs. The enhanced transverse electric polarized emission indicates that the strain in AlGaN/AlGaN MQWs was modified by lowering the AlGaN barrier growth rate.

Intelligent optimization design of electron barrier layer for AlGaN-based deep-ultraviolet light-emitting diodes

AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) are widely used in sterilization, sensing, water purification, medical treatment, non-line of sight (NLOS) communication and many other fields. Especially it has been reported that the global novel coronavirus (COVID-19) can be effectively inactivated by the DUV light with a wavelength below 280 nm (UVC) within a few seconds, which has also attracted great attention. However, the external quantum efficiency (EQE) of UVC LED is still at a low level, generally not more than 10%. As an important component of EQE, internal quantum efficiency (IQE) plays a crucial role in realizing high-performance DUV-LED. In order to improve the IQE of AlGaN-based DUV-LED, this work adopts an electron blocking layer (EBL) structure based on InAlGaN/AlGaN superlattice. The results show that the superlattice EBL structure can effectively improve the IQE compared with the traditional single-layer and double-layer EBL structure for the DUV-LED. On this basis, the optimization method based on JAYA intelligent algorithm for LED structure design is proposed in this work. Using the proposed design method, the InAlGaN/AlGaN superlattice EBL structure is further optimized to maximize the LED’s IQE. It is demonstrated that the optimized superlattice EBL structure is beneficial to not only the suppression of electron leakage but also the improvement of hole injection, leading to the increase of carrier recombination in the active region. As a result, the IQE of the DUV-LED at 200 mA injection current is 41.2% higher than that of the single-layer EBL structure. In addition, the optimized structure reduces IQE at high current from 25% to 4%. The optimization method based on intelligent algorithm can break through the limitation of the current LED structure design and provide a new method to improve the efficiency of AlGaN-based DUV-LED.

Sidewall geometric effect on the performance of AlGaN-based deep-ultraviolet light-emitting diodes.

In this study, deep-ultraviolet light-emitting diodes (DUV LEDs) with different chip sidewall geometries (CSGs) are investigated. The structure had two types of chip sidewall designs that combined DUV LEDs with the same p-GaN thickness. By comparing the differences of the characteristics such as the external quantum efficiency droops, light output power, light extraction efficiency (LEE), and junction temperature of these DUV LEDs, the self-heated effect and light-tracing simulation results have been clearly demonstrated to explain the inclined sidewalls that provide more possibility pathway for photons escape to increase the LEE of LEDs; thus, the DUV LEDs with the CSG presented improved performance. These results demonstrate the potential of CSG for DUV LED applications.

Implementation of electron restriction layer in n-AlGaN toward balanced carrier distribution in deep ultraviolet light-emitting-diodes

The distribution of electrons and holes inside the multiple-quantum wells is highly non-uniform for AlGaN-based deep ultraviolet light-emitting diodes (DUV-LEDs) due to both insufficient hole injection and excessive electron leakage. A key factor to improve the quantum efficiency of DUV-LED is to reduce the proportion of hot electrons in n-AlGaN through carrier deceleration. In this work, we propose a structure design by introducing an additional Al0.55Ga0.45N/Al0.42Ga0.58N superlattice electron restriction layer between the active region and n-AlGaN for electron deceleration. The superlattice structure not only reduces the mobility of the electrons, which helps to balance the distribution of carriers in the active region, thus, promoting radiative recombination, but also facilitates the lateral transport of the electrons, thus, reducing the current crowding effect through band engineering. Low temperature electroluminescence analysis reveals that the improvement of quantum efficiency is due to both enhanced carrier injection efficiency and radiation recombination efficiency in the active region.

Theoretical and Computational Analysis of a Wurtzite-AlGaN DUV-LED to Mitigate Quantum-Confined Stark Effect with a Zincblende Comparison Considering Mg- and Be-Doping.

In this work, an AlGaN-based Deep-Ultraviolet Light-Emitting Diode structure has been designed and simulated for the zincblende and wurtzite approaches, where the polarization effect is included. DFT analysis was performed to determine the band gap direct-to-indirect cross-point limit, AlN carrier mobility, and activation energies for p-type dopants. The multiple quantum wells analysis describes the emission in the deep-ultraviolet range without exceeding the direct-to-indirect bandgap cross-point limit of around 77% of Al content. Moreover, the quantum-confined Stark effect on wavefunctions overlapping has been studied, where Al-graded quantum wells reduce it. Both zincblende and wurtzite have improved electrical and optical characteristics by including a thin AlGaN with low Al content. Mg and Be acceptor activation energies have been calculated at 260 meV and 380 meV for Be and Mg acceptor energy, respectively. The device series resistance has been decreased by using Be instead of Mg as the p-type dopant from 3 kΩ to 0.7 kΩ.

Simulation and theoretical study of AlGaN-based deep-ultraviolet light-emitting diodes with a stepped electron barrier layer

Owing to the COVID-19 outbreak, sterilization of deep-ultraviolet light-emitting diodes (DUV LEDs) has attracted increasing attention. Effectively improving the radiative recombination efficiency and mitigating the efficiency degradation, mainly caused by electron leakage and nonradiative recombination, have also emerged as two of the main issues to be addressed. In this study, a DUV LED epitaxial structure with a novel electron-blocking layer (EBL) is proposed. The DUV LED with a luminescence wavelength of ∼297 nm was formed by the stepwise variation of the Al component. Through the simulation and analysis of its performance parameters, we found that, compared to the conventional EBL structure, this new EBL structure not only reduces the electron leakage to the p-region effectively but also increases the hole injection into the active region, resulting in an increase in carrier concentration in the active region, a two-to-three-fold increase in the radiative recombination rate, and a 58% increase in the internal quantum efficiency, thus alleviating the efficiency droop and achieving a more efficient operation at high current densities.

Enhancement of the light output efficiency and thermal stability of AlGaN-based deep-ultraviolet light-emitting diodes with Ag-nanodot-based p-contacts and an 8-nm p-GaN cap layer.

The efficiency of AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) is limited by the high absorption issue of the p-GaN contact layer or poor contact properties of the transparent p-AlGaN contact layer. Enhancement of the light output efficiency and thermal stability of DUV LEDs with an emission wavelength of 272 nm was investigated in this work. Ag nanodots on an 8-nm p-GaN cap layer were used to form ohmic contact, and Al and Mg reflective mirrors were employed to enhance the light output power (LOP) of DUV LEDs. However, serious deterioration of LOP occurred after the high-temperature process for the LEDs with Al and Mg reflective mirrors, which can be attributed to the damage to the ohmic contact properties. A Ti barrier layer was inserted between the Ag/p-GaN and Al layers to prevent the degeneration of ohmic contact. The wall-plug efficiency (WPE) of DUV LEDs fabricated by the Ag-nanodot/Ti/Al electrode is 1.38 times that of LEDs fabricated by adopting a thick Ag layer/Ti/Al at 10 mA after a high-temperature process. The Ag-nanodot/Ti/Al electrode on thin p-GaN is a reliable technology to improve the WPE of DUV LEDs. The experimental and simulated results show that the ohmic contact is important for the hole-injection efficiency of the DUV LEDs when p-GaN is thin, and a slight increase in the contact barrier height will decrease the WPE drastically. The results highlighted the importance of thermally stable ohmic contacts to achieve high-efficiency DUV LEDs and demonstrated a feasible route for improving the LOP of DUV LEDs with a thin p-GaN cap layer and stable reflective electrodes.

Balanced Resistivity in n-AlGaN Layer to Increase the Current Uniformity for AlGaN-Based DUV LEDs

In this work, by sandwiching a p-AlGaN layer into the n-AlGaN layer, we generate an energy barrier in the n-AlGaN layer to improve the current spreading effect of AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs). The abrupt energy barrier can balance the resistivity in the n-AlGaN layer, and this leads to the better lateral current distribution in the p-type hole injection layer. Numerical and experimental results show that the homogenized current distribution enables the enhanced external quantum efficiency (EQE) for the proposed DUV LED. In addition, the better conductivity modulation arising from the more homogenized current distribution decreases the forward voltage and suppresses the self-heating effect.