Abrasive Slurry Research Articles

Modeling eroded topography in masked abrasive slurry jet pocket milling

Abrasive slurry and water jets can be used together with erosion-resistant masks to rapidly machine micro-pockets. However, the use of masks can result in an undesirable erosion and mask under-etching which can locally increase the depth twofold or more in the vicinity of the mask edges. Although the detailed mechanisms leading to the undesirable erosion are not well understood, they appear to be related to the interaction of the jet flow with the mask edge. This paper employs novel experimental techniques and coupled computational fluid dynamics/surface evolution models to rigorously study these mechanisms for the first time. To demonstrate the techniques, the abrasive slurry jet micromachining of pockets into Al 6061-T6 using SS304 masks was considered, using a novel technique to precisely control the position of the abrasive slurry jet relative to the mask edge. The model reasonably accurately predicted the surface evolution and undesirable erosion in various scenarios, as well as the physics of mask under-etching. The position of the jet relative to the mask edge and the scanning direction were found to strongly affect the extent of undesirable erosion. The model suggests that the stagnation zone in masked milling is smaller than that in unmasked milling, and that this facilitates the formation of slurry recirculation zones near the mask edges which, together with particle ricochets off the mask edge, interact to create the undesirable erosion and under-etching. Based on this improved understanding, several path strategies were presented that were found to minimize the undesirable erosion and thus allow the milling of pockets with more uniform depths.

Characterization of oscillatory magnetic field-assisted finishing of directed energy deposition NASA HR-1 integral channels

Additive manufacturing (AM), such as directed energy deposition (DED), enables fabrication of complex geometries for critical parts at near-net shape, but creates a need for post-processing to achieve desired geometry and performance. In particular, parts made using DED are sometimes printed with a high initial surface roughness, requiring post-processing to meet application-dependent requirements. Magnetic field-assisted finishing (MAF), in which a magnetic polishing tool is manipulated by magnetic force and generates relative motion against a target surface, has been applied to smooth AM parts. An advantage of MAF is that the magnetically manipulated polishing tools can finish both external part surfaces and part interiors. In this paper, an oscillating magnetic polishing tool is proposed to smooth the inner surfaces of rectangular NASA HR-1 alloy channels made using DED. Because effective tool motion allows reduction of surface roughness and waviness, parameters that control polishing-tool motion are of great interest. This paper describes three parameters that control polishing-tool motion: number of polishing tools, magnetic field, and abrasive slurry. The effects of tool motion on the polishing characteristics are demonstrated, showing that the roughness of the interior channel surface can be reduced from several tens of micron to a sub-micron level.

Optimization of abrasive slurry assisted rotating ultrasonic machining for enhanced micro-channel fabrication on ceramic silicon wafer (111)

This study examined the impact of abrasive slurry assisted Rotating Ultrasonic Machining (RUM) using Boron Carbide (B4C) powder of three mesh sizes: 400 Mesh, 600 Mesh, and 800 Mesh. The effects of abrasive size, feed rate, and tool rotation on Material Removal Rate (MRR) and Surface Roughness (SR) were investigated. The highest MRR of 3.454 mm³/min was achieved with 400 mesh, 30 mm/min feed rate, and 1250 rpm due to larger abrasive size, medium feed rate, and medium tool rotation velocity, while the lowest MRR of 0.284 mm³/min was noted with 600 mesh, 30 mm/min feed rate, and 1500 rpm, attributed to intermediate abrasive size and high tool rotation. The lowest SR of 1.16 μm was observed at 800 mesh, 15 mm/min feed rate, and 1500 rpm, resulting from smaller abrasive size and higher tool rotation facilitating polishing action and vibrational dampening. The highest SR of 3.71 μm occurred at 400 mesh, 45 mm/min feed rate, and 1500 rpm, due to larger abrasive size, higher feed rate, and tool rotation, increasing surface corrosion. ANOVA and regression analyses highlighted mesh size as the most significant parameter for both MRR and SR, with strong model-experimental value correlations. The findings demonstrate the suitability of abrasive slurry assisted RUM for fabricating micro-channels in X-Ray, optoelectronic, and semiconductor applications.

Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism

Chemical mechanical polishing (CMP) is currently the most widely used method for material removal and surface planarization of glass. An environmentally friendly method of improving polishing performance by using a mixed abrasive slurry of ceria and diamond was proposed in this study. The results of polishing experiments showed that compared with single ceria abrasive, the materials removal rate (MRR) of the mixed abrasive slurry increased from 82.7 nm/min to 109.6 nm/min, while the surface roughness (Ra) decreased from 26.4 nm to 0.6 nm after polishing. An amorphous reaction layer formed during the CMP process was observed directly using transmission electron microscopy. Thermodynamic analysis was conducted to investigate the interfacial chemical reactions during the polishing process. A model was proposed to describe the mechanism of the materials removal.

Investigating Slurry Flow Patterns in Chemical Mechanical Polishing (CMP) Using Computational Fluid Dynamic (CFD) Simulations

Chemical Mechanical Polishing has emerged as a leading area approach for planarizing wafer surfaces during semiconductor manufacturing due to its ability to provide defect-free and uniform surfaces. Achieving nanoscale planarity on a wafer and die is one of the most significant steps in the process [1]. As part of the CMP process, it is essential to understand the interactions between consumables to facilitate the production of smooth and mirror-like surfaces [2], [3]. Simulation and numerical modeling have become critical means for elucidating intricate flow patterns to probe the underlying fundamentals of CMP processes. The computational fluid dynamics (CFD) simulations provide a detailed understanding of fluid flow behavior for various conditions [4], [5]. This study uses a three-dimensional CFD simulation to provide an understanding of the slurry flow pattern and its effects on CMP performance. Several CFD simulations were performed to study the effect of different parameters on slurry flow patterns. The simulations provided information on the interaction between the slurry, the wafer surface, and the polishing pad, in addition to the abrasive distribution, slurry velocity, and pressure variations within the CMP tool. It was observed that changing the pad and wafer rotation speeds, the wafer-pad gap size and the center-to-center distance affect the slurry flow conditions. For the same rotational speeds, as the center-to-center distance decreases, the flow velocity increases toward the wafer edge. Moreover, with the same rotation speed, the pad rotation dominates the wafer rotation speed.[1] B. Suryadevara, Advances in Chemical Mechanical Planarization (CMP). Woodhead Publishing, 2021.[2] J. Seo, Journal of Materials Research, 36, 235–257, 2021.[3] A. R. Mazaheri and G. Ahmadi, J Electrochem Soc, 150, G233, 2003.[4] J. Tu, K. Inthavong, and G. Ahmadi, Springer Science & Business Media, 2012.[5] G. Ahmadi, “Chapter 2 -, R. Kohli and K. L. Mittal, Eds., Oxford: William Andrew Publishing, 2012, pp. 81–105.

Exploring wear resistance: Three-body abrasion evaluation of HVOF-sprayed TiC and CoNi coatings on SS316 steel

This study investigated the performance of High-Velocity Oxygen Fuel (HVOF)-sprayed Titanium Carbide (TiC) and TiC + 50C (50%TiC + 50%CoNi) coatings on SS316 steel under three-body abrasion conditions. The microstructural analysis revealed a homogeneous distribution of TiC particles within the TiC coatings, while the TiC + 50C coatings exhibited a more complex microstructure due to the presence of Co-Ni alloy. Mechanical testing demonstrated the superior microhardness of TiC coatings compared to the SS316 substrate, suggesting enhanced wear resistance. Slurry abrasion tests indicated reduced mass loss rates for both TiC and TiC + 50C coatings compared to uncoated SS316 steel, with TiC coatings exhibiting superior resistance to abrasive wear. Post-abrasion examination revealed distinct wear patterns, including abrasive chipping, plowing marks, crater formation, wear traces, and surface ruggedness.

3 Body abrasion test of HVOF sprayed WC-10Co-4Cr and WC-10Co-4Cr + 2 % graphene coating on IS-2062 steel

This study investigates the microstructural characteristics, mechanical properties, and slurry abrasion resistance of WC-10Co-4Cr and WC-10Co-4Cr + GNPs coatings deposited using the High-Velocity Oxy-Fuel (HVOF) process. Cross-sectional micrographs, EDS line scans, and spectra reveal uniform distribution and proper adhesion of tungsten carbide particles, cobalt, chromium, and graphene nanoplatelets (GNPs) throughout the WC-10Co-4Cr + GNPs coating. Microstructural analysis indicates denser structure and reduced porosity in the WC-10Co-4Cr + GNPs coating, leading to enhanced abrasion resistance. Mechanical testing demonstrates higher microhardness and bond strength in the WC-10Co-4Cr + GNPs coating, attributed to the incorporation of GNPs and Laser Surface Texturing (LST). Slurry abrasion tests show substantial reductions in mass loss for both coatings compared to the pristine substrate, with the WC-10Co-4Cr + GNPs coating exhibiting superior performance due to its densification and lubrication effect of GNPs. Overall, the WC-10Co-4Cr + GNPs coating presents a promising solution for applications requiring high wear resistance and durability in harsh environments.

Slurry Abrasion and Dry Sliding Behavior of High-Velocity Oxy-Fuel (HVOF) Sprayed WC-12Co and WC-10Co-4Cr Coatings on EN8 Tillage Material

Slurry Abrasion and Dry Sliding Behavior of High-Velocity Oxy-Fuel (HVOF) Sprayed WC-12Co and WC-10Co-4Cr Coatings on EN8 Tillage Material

Assessment of Changes in Abrasive Wear Resistance of a Welded Joint of Low-Alloy Martensitic Steel Using Microabrasion Test.

Martensitic low-alloy steels are widely used in machine construction. Due to their declared weldability, arc welding is most often used to join elements made of this type of steel. However, the high temperature associated with welding causes unfavourable changes in the microstructure, resulting in reduced abrasion resistance. Therefore, it is important to know the tribological properties of the welded joint. This article presents the results of a study on the abrasion wear resistance of a welded joint of an abrasion-resistant steel. This study tested a welded joint of an abrasive-resistant steel produced by the arc welding method. Wear testing of the welded joint was carried out under laboratory conditions by the ball-cratering method in the presence of abrasive slurry on the cross-section of the welded joint. Based on the test results, the change in the abrasive wear rate of the material as a function of the distance from the welded joint axis was determined. It was also found that the thermal processes accompanying welding caused structural changes that increased the wear rate index value. Adverse changes in the tribological properties of a welded material persist up to a distance of approx. 20 mm from the weld centre.

Generation of array of square microcavity on quartz by ultrasonic micromachining process utilizing developed micro tool

Quartz possesses distinct characteristics such as exceptional hardness, high brittleness, non-conductivity, remarkable corrosion resistance, efficient transmission within specific wavelengths, strong electrical insulation properties, and the ability to withstand high temperatures and thermal shocks. These extraordinary attributes have led to its component in a wide range of applications, including the fabrication of microelectronic chips, biochips, biological channels, microfluidics, optical lenses, beam-splitting lenses, etc. Ultrasonic micromachining (USMM) is a highly promising technique within the realm of micromachining to create micro features on quartz surfaces. In the present research, array of square micro tools has been designed and developed by the wire-electrical discharge machining (EDM) process. By utilizing the developed array of square micro tools, microcavity arrays have been generated by the USMM process. The influences of process parameters on material removal rate (MRR), width deviation (WD), angular deviation, and taper of square microcavities have been investigated in the present research work. The higher MRR is obtained as 1.427 mm3/min at higher abrasive slurry concentration and lower WD of micro cavities is obtained as 37 µm and lower taper angle is 1.109° at 5% abrasive slurry concentration. The lower value of angular deviation is obtained as 0.836° at a lower power rating during the generation of an array of square microcavity on quartz by the USMM process. By employing array of micro tools, the accuracy of micro features can be improved, and also productivity can be increased.

Effects of niobium and molybdenum addition on microstructural characteristics and wear properties of 14 wt%Cr white cast irons

White cast iron (WCIs) alloys were developed by adding Nb, Mo, and a combination of both (∼3 wt% Nb, ∼3 wt% Mo, ∼1 wt% Mo-2 wt% Nb) through melting and casting. The objective was to analyze the microstructural characteristics of the alloys, as well as the impact of reinforcing carbides on their mechanical and tribological properties. The alloy containing the highest percentage of niobium exhibited a refined microstructure, tending towards a eutectic structure, unlike the Mo-containing materials with totally hypoeutectic microstructures. The microstructural characteristics of the alloys and morphology of niobium carbides, as well as the percentage of M7C3 eutectic carbides produced were affected by the varying percentages of Nb and the Mo–Nb combination. Moreover, thermodynamic simulations revealed that the NbC carbide precipitated before the M7C3 eutectic carbides, austenite dendrites, and the MC (composed mainly of Nb containing bound Mo) carbide resulting from the Mo–Nb combination. The alloys containing Mo had similar bulk hardness values, while the alloy with the highest percentage of Nb showed a higher bulk hardness value. This was attributed to the effect of Nb on microstructure refinement and on the production of M7C3 eutectic carbides from the alloy. Although there were different reinforcing carbides (NbC, MC and M2C), the differences in microstructural characteristics had no noticeable influence on the Charpy impact energy. Micro-scale abrasive wear test (conducted with SiC abrasive slurry) demonstrated that the reinforcing carbides MC and mainly NbC had a beneficial effect in blocking and preventing the progression of continuous micro-cuttings and formation of grooves. The M7C3 and M2C carbides were less effective at protecting the matrix against the high-hardness SiC abrasive.

Abrasive Slurry Jet Characteristics Study

In this paper, a coupled computational fluid dynamics-discrete element (CFD-DEM) approach is used to investigate the performance of abrasive slurry jets. Firstly, the CFD method was used to simulate the VES slurry jet flow characteristics. Secondly, an orthogonal design method was used to analyse the sensitivity of the parameters of zero shear viscosity , relaxation time and flow index of the Cross fluid, in which zero shear viscosity had the most significant effect on the flow field. As the zero-shear viscosity increases, the velocity of the flow field gradually increases, but the core section of the jet becomes less concentrated and the core section of the jet decreases. Based on the VES fluid formulation used in this project, the optimum zero-shear viscosity, relaxation time and flow index were optimised to 2.5 Pa-s, -0.1s and 0.2 respectively. The results showed that the addition of VES surfactant enhanced the erosion rate of the specimens and that the erosion rate increased with increasing OTAC concentration.

Topography prediction of high-aspect ratio features milled with overlapping abrasive slurry jet footprints considering fluid confinement effects

Overlapping adjacent passes of abrasive slurry jets can be used to fabricate micro-pockets or blind micro-slots. This study investigates the propagation of surfaces milled using overlapping passes of a high-pressure abrasive slurry jet on a ductile 6061-T6 target over a wide range of aspect ratios. Features such as shallow pockets with low aspect ratios to deep slots with aspect ratios ∼1.5 were fabricated to investigate the correlations between the aspect ratio, degree of pass overlap, and number of repeating passes with the machined surface evolution characteristics. A comprehensive model was presented that combined computational fluid dynamics (CFD) with surface evolution to predict the evolving machined feature topography after each of the overlapping and repeating passes, and to provide insights into experimental observations. The model explicitly considered the CFD-predicted local particle impact angles and velocities as well as effects due to secondary impacts, high sidewall slopes, and stagnation effects. For larger degrees of overlap, measurements revealed a more than linear rate of increase in depth after each repeat of two adjacent overlapped passes, as opposed to a linear depth increase for smaller overlaps and blind pockets. Large overlaps were found to result in asymmetric features. Up to a critical aspect ratio of ∼0.65, the model predicted the surface evolution of the features to within <8.6% of those measured. Beyond that, randomness in the machined feature shape and size made the process challenging to control and the surface evolution difficult to predict. Nevertheless, the model was able to elucidate the reasons for the randomness and other observed phenomena such as the more than linear growth in etch rate, and the occurrence of feature asymmetry. The findings emphasize that flow confinement, increases in the jet's turbulent kinetic energy, and the formation of vortices at the bottom of the machined features are critical factors influencing the machining process, and that in these cases explicit modeling approaches like the one presented in this study must be used.

Development of a Lab-Scale Tribo-Electrochemical Approach for Chemical Mechanical Planarization

During chemical mechanical planarization (CMP), the electrochemical interactions between slurry additives and the polishing substrate metal films favor the formation of easily removable species that are then detached by mechanical abrasion effects of the CMP pad and nanoparticle abrasives in slurry. Yet, neither the mechanical nor chemical aspects alone dictate the CMP process; rather, it is the intertwined dependencies of tribology and electrochemistry that often control the polish performance. This highlights the importance of the functional synergies, otherwise known as tribo-electrochemistry, which has been largely under-explored in the CMP research community.This work discusses the development of a novel small-scale tribo-electrochemical approach for metal CMP. It covers the tool design aspects, tribo-electrochemical measurements such as open circuit potentiometry (OCP) and polarization resistance, and relevance to CMP applications. The system is developed based on a small-scale CMP polisher coupled to a 3-electrode cell design circuit that is connected to a potentiostat. The design utilizes a common type of CMP metal film as the working electrode, with the accompanying pad and slurry consumables serving as baseline for method development. All other process conditions, including rotating speed, downforce, polish-hold duration, and pad conditioning process follow typical CMP standards.The results show tribo-electrochemical responses to the presence of catalyst (C), oxidizer (O), inhibitor (I), and abrasive (A) in the experimental slurries. The data is of significant value in terms of the anodic & cathodic site functions on the CMP metal surface and in the context of material removal. In addition, notable sensitivity to pad texture, downforce, and temperature effects were observed, and removal rate measurements correlated with polarization resistance for varied levels of the O and I additives. In summary, the tribo-electrochemical aspects of CMP have been probed and an innovative analytical approach has been developed and demonstrated.

Fabrication of Vitrified Bond Diamond Grinding Wheel via LCD Photopolymerization

In this paper, a liquid crystal display (LCD) photopolymerization method is proposed, and a vitrified bond diamond grinding wheel is successfully prepared. A high-performance vitrified bond was obtained by melting SiO2-B2O3-Al2O3-Na2O ceramic raw materials and used for grinding wheel preparation. LCD photopolymerization technology is characterized by high precision in shaping, fast processing speed, and superior quality, making it a promising technology for fabricating vitrified bond diamond grinding wheels. The preparation of vitrified bond slurry with high solid content and low viscosity was extensively investigated to meet the fabrication requirements. The effects of dispersant, the particle size of the vitrified bond, and solid content on the viscosity of the slurry were systematically analyzed. The vitrified bond slurry with solid content up to 65 wt.% (approximately 45.5 vol.%) was successfully prepared and met the requirements for printing. Furthermore, we explored the optimal formulation of the grinding wheel, debinding and sintering conditions, sintering temperature, grit-to-bond ratio, and the evaluation of the grinding performance of the wheel on hard and brittle materials, such as silicon carbide ceramic. Vitrified bond and abrasive slurry systems with a solid content of 65 wt.% (approximately 42.8 vol.%) were prepared. The results show that the vitrified bond diamond grinding wheel exhibits optimal comprehensive performance, with a sintering temperature of 680 °C and a grit-to-bond ratio of 4:6. The minimum surface roughness of the workpiece after grinding was 1.767 μm, the material removal rate was 5.08 mg/s, the grinding ratio was 9.78, and the friction coefficient was stabilized at about 0.5 during grinding. This paper guides the manufacturing of vitrified bond diamond grinding wheels via LCD photopolymerization.

Impact of toothbrush head configuration and dentifrice abrasivity on non-carious cervical lesions in-vitro

ObjectiveTo investigate the effect of toothbrush head configuration and dentifrice slurry abrasivity on the development of simulated non-carious cervical lesions (NCCLs) in vitro. MethodsExtracted premolars were randomly allocated into 15 groups (n = 16) generated by the association between toothbrush head configuration (flat-trimmed, rippled, cross-angled/multilevel/rubbers added, cross-angled/multilevel/flex head, feathered) and dentifrice slurry abrasivity (low/medium/high). Teeth were mounted on acrylic blocks and had their roots partially covered with acrylic resin, leaving 2-mm root surfaces exposed. Toothbrushing was performed for 35,000 and 65,000 double-strokes. Specimens were analyzed using non-contact profilometry for dental volume loss (mm3) and lesion morphology. Data was analyzed using ANOVA with pairwise comparisons and Kruskal-Wallis tests. ResultsThe two-way interaction between toothbrush head configuration and slurry abrasivity was significant (p = 0.02). At 35,000 strokes, the flat-trimmed and cross-angled/multilevel/rubbers added toothbrushes caused the highest loss, when associated to the high-abrasive slurry (p<0.05); whereas cross-angled/multilevel/flex head showed the least loss, when associated to the low-abrasive (p<0.05). At 65,000, more dental loss was observed for all toothbrushes when associated to the high-abrasive slurry, with flat-trimmed causing the highest loss (p < 0.05). Lower dental loss rates were observed for cross-angled/multilevel/flex head associated to the low-abrasive slurry when compared to the other toothbrushes (p < 0.05), except to feathered (p = 0.14) and rippled (p = 0.08). Flat lesions (mean internal angle ± standard-deviation: 146.2°± 16.8) were mainly associated with low-abrasive slurry, while wedge-shaped lesions (85.8°± 18.8) were more frequent with medium- and high-abrasive slurries. ConclusionThe development, progression and morphology of simulated NCCLs were modulated by both toothbrush head configuration and dentifrice abrasivity. Clinical significanceDental professionals should consider both the type of toothbrush and dentifrice abrasivity in the management plan of patients at risk of developing NCCLs.

Effect of Micro Abrasive Slurry Jet Polishing on Properties of Coated Cemented Carbide Tools

Owing to the popularization of coating technology, physical Vapor Deposition (PVD) coated tools have become indispensable in the cutting process. Additionally, the post-treatment of coated tools applied to industrial production can effectively enhance the surface quality of coating. To improve the processing performance of coated tools, micro abrasive slurry jet (MASJ) polishing technology is first applied to the post-treatment of coated tools. Subsequently, the effects of process parameters on the surface quality and cutting thickness of coating are investigated via single-factor experiments. In the experiment, the best surface roughness is obtained by setting the working pressure to 0.4 MPa, particle size to 3 μm, incidence angle to 30°, and abrasive mass concentration to 100 g/L. Based on the results of the single-factor experiments, combination experiments are designed, and three types of coated tools with different surface qualities and coating thicknesses are obtained. The MASJ process for the post-treatment of coated tools is investigated based on a tool wear experiment and the effects of cutting parameters on the cutting force and workpiece surface quality of three types of cutting tools. The result indicates that MASJ machining can effectively improve the machining performance of coated tools.

CFD analysis of turbulent free high-speed water jet issuing from circular and non-circular nozzle geometry in context of abrasive slurry jet machining

CFD analysis of turbulent free high-speed water jet issuing from circular and non-circular nozzle geometry in context of abrasive slurry jet machining

Cetyltrimethylammonium bromide reformed ceria nanocomposites of chemical mechanical planarization for silica wafers

BackgroundChemical-mechanical planarization (CMP) is the most important process in the semiconductor industry, as it affects the product manufacturing yield. Of the several factors involved in planarization, the choice of abrasive slurries affects the extent to which impurities and roughness are removed. Cerium oxide (CeO2) is considered an outstanding polishing material because of its excellent hardness, well-controlled structure, and chemical force, and CMP requires well-dispersed slurry nanoparticles (NPs) with uniform structure, size, and shape. In this study, urea/alkaline-induced nanocubic MethodsCeO2 was synthesized in the presence of cationic surfactant cetyltrimethylammonium bromide (CTAB)-generated cubic CeO2 NPs, which were then used in a silica wafer polishing test. Dynamic laser scattering and transmission electron microscopy indicated that the cubic plate NP size distribution and zeta potential ranged from 18 to 30 nm when measured between –35 and –45 mV. Elemental composition via X-ray photoelectron spectroscopy was studied to demonstrate the mechanism of Ce3+/Ce4+ with crystal information, which matched the X-ray diffraction grain size calculation and finite element–scanning electron microscopy measurements. We also performed a simulation of cubic CeO2 NP formation and pillar CeO2 inhibition under an additional amount of structure-modifying agent (e.g., CTAB). Fourier transform infrared spectra indicated a successful CTAB reaction with CeO2. Small angle X-ray scattering spectra were used to obtain simulated NP shapes and parameters via the SasView model. A confocal laser scanning microscope was then used to measure the roughness and 2-D plane view of an 8-inch tetraethyl orthosilicate coated silica wafer. Significant findingsOur results showed that the bared silica wafer planarize with CTABx-CeO2 NPs reduced the ISO grade number from Level 9 to Level 7, which corresponds to a 70.7–74.5% roughness planarization of the raw material. This study presents a fast, uniform, low-roughness CMP slurry material synthesis and characterization method that can enhance the technique of slurry nanoparticle synthesis from stable materials.

Seals extend MTBR and reduce water and power consumption

John Crane has developed a seal for customers who regularly work with harsh and abrasive slurries. It says that it is designed to extend mean time between repair (MTBR), whilst reducing the amount of power used and almost eliminate water consumption.