XPS and AES studies of ferroelectric (Pb, La)TiO3 thin films prepared by RF magnetron sputtering technique

Abstract

X-ray photoelectron spectroscopy as well as Auger electron spectroscopy studies were used for determining the chemical composition, compositional depth profile, and the chemical bonding of ferroelectric (Pb, La)TiO3 thin films deposited by RF magnetron sputtering technique. It was found that the chemical composition of the films and the chemical bondings of titanium in the near surface region are different from those in the ‘‘bulk'’ region of the films. The titanium atoms exist mainly in the forms of TiO and PbTiO3 in the near surface region, whereas in the bulk region, the chemical composition is in good agreement with stoichiometry and titanium atoms exist in the form of PbTiO3. The lead atoms exists in the form of PbTiO3 near the surface and in the ‘‘bulk'’ of the films.