X-ray diffuse scattering characterization of microdefects in highly Te-doped annealed GaAs crystals

Abstract

Diffuse scattering of x-rays is applied to studies of microdefects in annealed highly doped crystals of GaAs:Te. X-ray diffraction reciprocal space mapping was performed by high-resolution x-ray diffractometry in the triple-axis mode. The most characteristic feature of the experimental maps is the lack of the zero-intensity lines for all high-symmetry reflections. Owing to this aspect of measured maps it was possible to determine the type of microdefects. The computer simulations performed for point defects with orthorhombic symmetry in annealed crystals of GaAs fit very well to the patterns of measured iso-intensity contours. The experimental data obtained so far give the possibility of determining the displacement field outside the defect core but are not sufficient to obtain information about the interior of the defect. The mean radius of microdefects was estimated to be smaller than 0.2 m.