Abstract
In this work, we report the spontaneous formation of superlattice structures in nominal InGaN films grown by plasma-assisted molecular beam epitaxy. A 700-nm-thick self-assembled ${\mathrm{In}}_{0.2}{\mathrm{Ga}}_{0.8}\mathrm{N}/\mathrm{GaN}$ superlattice with excellent structural quality was achieved. Strain was studied as a possible driving force for the formation of self-assembled superlattice (SASL) structure by growth of InGaN on ZnO substrate using similar growth conditions. The SASL structures were optically characterized using photoluminescence spectroscopy. Structural characterization was conducted via transmission electron microscopy and atom probe tomography. High-resolution x-ray diffraction (XRD) and XRD reciprocal space map were utilized to determine the average composition and the degree of relaxation of InGaN films. We propose that the vertical phase separation observed in the SASL structure is caused by high-temperature growth and intensified by strain. This work provides a method for engineering strain and growth of thick InGaN films for a variety of applications including solar cells and photodetectors.
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