Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

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The control of the surface wettability of poly (methyl methacrylate) (PMMA) substrates has been successfully demonstrated using an Ar2* excimer lamp radiating 126 nm vacuum ultraviolet (VUV) light. Each of the samples was exposed to 126 nm VUV light in air over the pressure range of 2×10−4–105 Pa. Although at the process pressures of 10, 103, and 105 Pa, the PMMA surfaces became relatively hydrophilic, the degree of hydrophilicity depended markedly on the pressure. The minimum water contact angles of the samples treated at 10, 103, and 105 Pa were about 50°, 33°, and 64°, respectively. These values were larger than those of PMMA substrates hydrophilized through 172 nm VUV irradiation conducted under the same conditions. On the other hand, after 126 nm VUV irradiation conducted under the high vacuum condition of 2×10−4 Pa, the PMMA substrate surface became carbon-rich, probably due to preferential cross-linking reactions, as evidenced by x-ray photoelectron spectroscopy. This surface was hydrophobic, showing a water contact angle of about 101°. Although the 126 nm VUV-irradiated surfaces appeared relatively smooth when observed by atomic force microscope, very small particles with diameters of 30–60 nm, which probably originated from the readhesion of photodecomposed products, existed on all of the sample surfaces.