Wafer scale tilt-compensated silicon nanowire atomic force microscopy probes for high aspect ratio geometries

Abstract

Using site controlled growth of single vapor-liquid-solid silicon nanowires, high aspect ratio tilt-compensated atomic force microscope probes are fabricated on a wafer scale. Methods are developed to sculpt the tips of these probes for desirable performance attributes. Probe performance is explored by imaging high aspect ratio structures using an atomic force microscope. Wafer scale tilt-compensated silicon nanowire probes are an excellent mass producible platform for non-destructive topographic imaging of high aspect ratio features.