Fabrication of high aspect ratio atomic force microscope probes using focused ion beam milled etch mask

Abstract

The shape and dimension of atomic force microscope (AFM) probes are essential considerations to acquire high resolution images at the nanoscale. In the cases of nanostructures with high aspect ratio (HAR) features, including dot and line arrays, commercially available standard silicon AFM probes fail to provide satisfactory results. This is due to the low aspect ratio pyramidal tip profile which cannot adequately follow the sample surface. Here a simple method is introduced to convert commercially available pyramidal probes to HAR probes by combining focused ion beam (FIB) and plasma etching techniques. A bilayer metal is deposited on standard AFM probes using e-beam evaporation, followed by a quick FIB milling process to pattern the very thin top metal layer. The FIB milled metal layer is used as the hard mask to transfer the pattern to the underlying metal layer and an HAR pillar on top of the tip apex was achieved via plasma etching. Compared to the traditional HAR tip fabrication, where the tips are individually manufactured at high cost and in a time-consuming fashion, our method significantly reduces the usage of FIB milling. Additionally, this method is suitable for batch fabrication via plasma etching once the simple FIB milling step is performed.