Abstract
Abstract This paper presents an optimized, lithographically patternable SU-8/Graphene nanocomposite based piezoresistive strain sensor for localized, high-precision assessment, which marks a significant advancement in the field of soft-MEMS based technologies. The fabrication process involves the photolithography of a SU-8/Graphene nanocomposite with a minimum resolution of 50µm, resulting in a material with excellent electrical conductivity and mechanical properties. Specifically, a 3% SU-8/Graphene composition was chosen to exceed the percolation threshold, enabling substantial changes in the resistance %ΔR/R and facilitating photopatternability. The sensor exhibited exceptional performance characteristics, including a rapid response time of 0.1 seconds and a wide bending range from 0o to 60o. Notably, it demonstrated a remarkable %ΔR/R of 19.21, indicating its superior sensing capability. Such high sensitivity is crucial for applications that require precise, localized measurements, such as biomedical engineering, sports science, and smart healthcare.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
