Void shape control in GaN re-grown on hexagonally patterned mask-less GaN

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We present the results of GaN re-growth on hexagonally patterned GaN templates. Sapphire was used as the original substrate and the samples were grown by metalorganic vapor phase epitaxy (MOVPE). The re-growth on the patterned templates results in the formation of voids at the GaN/sapphire interface. Our extensive scanning electron microscopy (SEM)-based experimental investigations show that the void shape can be controlled from nearly vertical to fully inclined configurations. It was found that the initial hexagon hole diameter plays a key role in determining the final profile of the void sidewalls. X-ray diffraction analysis of the GaN layers indicates that the layers with inclined sidewall voids have an improved crystalline quality. Knowledge of the void configurations in the GaN layers and a possibility to control their shape can help in enhancing light extraction from the light emitting structures.