Abstract
In May 2006, the Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) at the Association of Super-Advanced Electronics Technologies (ASET) launched 4-year program for reducing mask manufacturing cost and TAT by concurrent optimization of MDP, mask writing, and mask inspection [1]. One area of the project focuses on the extraction and utilization of repeating patterns. The repeating patterns are extracted from the mask data after OPC. The information is then used in Character Projection (CP) for reducing the shot counts during the electron beam writing. In this paper we will address the verification of the efficiency in extracting repeating pattern from the actual device production data obtained from the member companies of MaskD2I, and will report on the improvement of the software tool by these results.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
