Abstract
Association of Super-Advanced Electronics Technologies (ASET) Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) started a 4-year development program for the total optimization of mask design, drawing, and inspection technologies to reduce photomask manufacturing costs in 2006. At the Mask Writing Equipment Technology Research Laboratory, we are developing an e-beam exposure system introducing concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam), which has several times higher throughput than currently commercially available e-beam writing systems.
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