Abstract
Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for achieving arbitrary, nanoscale features, over large areas without the use of costly step-and-repeat UV lithography tools. One requirement for NIL is to eliminate adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter. Previous work on thick (>100nm) diamondlike carbon (DLC) layers indicates that fluorinated DLC (F-DLC) provides a durable antiwear, antistick layer. In this work, a process for depositing an ultrathin layer of F-DLC is shown for SiO2 based imprinters.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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