Abstract
Fluorinated diamond-like carbon (F-DLC) has recently been applied as an antisticking layer on nanoimprint molds for semipermanent use, replacing the self-assembled monolayer currently used. An SiO2/Si mold was successfully coated with an F-DLC thin layer by chemical vapor deposition (CVD). The measured water contact angle of the F-DLC surface was 103°, which is 30° higher than that of the DLC surface. This value indicates the adequacy of F-DLC as an antisticking layer. Moreover, an F-DLC film had a high hardness of 24 GPa, similar to that of a DLC film (26 GPa). AZ resist patterns of 150 nm linewidth and 350 nm pitch were successfully obtained by thermal nanoimprinting using an F-DLC-coated mold. Finally, after repeating the imprinting for more than 100 times, the initial water contact angle of 103° for the surface of the F-DLC-coated mold was maintained.
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