Abstract
Nanoimprint lithography (NIL) has proven to be an exceptional lithographic technique for nanoscale features. The elimination of the adhesion of the imprinted polymer to the imprinter upon withdrawal of the imprinter is crucial for a reliable transfer of the nanoscale pattern. Previous work on thick (>100 nm) diamond-like carbon (DLC) layers indicates fluorinated diamond-like carbon (F-DLC) provides a durable anti-wear, anti-stick layer. In this work, a process for depositing an ultra-thin layer of F-DLC is shown using current imprinter substrates.
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