Abstract

The PVD deposition of films with excellent surface properties has been a persistent area of research. In this paper, bipolar high power impulse magnetron sputtering with small target-substrate distance is proposed, and ultra-hard Cr films have been deposited with a higher rate in tubes. The microstructure and mechanical properties of the films were characterized using X-ray diffraction, scanning electron microscopy, nanoindentation and scratch test, and compared with films prepared under conventional conditions. With target-substrate distance of 7.5 mm, the ultrafine columnar structure is fabricated due to intensive glow discharge and direct particle-bombardment in high-density plasma. The small grain size of 7.4 ± 0.3 nm is observed although deposition rate as high as 10 μm/hr. The nanohardness of the films reaches 19.94 ± 1.14 GPa, much higher than that reported in the literatures. Meanwhile, the adhesion between film and substrate may be as high as 77 ± 5 N.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.