Ultra-narrow dual-band perfect absorber based on double-slotted silicon nanodisk arrays

Abstract

Abstract Due to its unique advantage of optical properties, nanophotonic metamaterials have gained extensive applications in perfect absorbers. However, achieving both dual-band and ultra-narrow linewidth in absorbers simultaneously remains a challenge for typical metal-dielectric based metamaterials. In this work, a dual-band ultra-narrow perfect absorber consisting of a double slotted silicon nano-disk array that located on a silver film with a silica spacer layer is proposed theoretically. By combining the hybrid mode excited by the coupling of diffraction wave mode and magnetic dipole mode with the anapole-anapole interaction, two absorption peaks can be induced in the near-infrared regime, achieving nearly perfect absorbance of 99.31% and 99.61%, with sub-nanometer linewidths of 1.92 nm and 1.25 nm respectively. In addition, the dual-band absorption characteristics can be regulated by changing the structural parameters of the as-proposed metamaterials. The as-designed metamaterials can be employed as efficient two-channel refractive index sensors, with a sensitivity and figure of merit of 288 nm/RIU and 150 RIU-1 for the first band, and a sensitivity and figure of merit of up to 204 nm/RIU and 163.2 RIU-1 for the second band. This work not only opens up a new design idea for the realization of dual-band perfect absorber synchronously with ultra-narrow linewidth, but also provides potential attractive candidates for developing dual-frequency channel sensors.