Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires

Abstract

Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such as aluminum. Scanning Electron Microscopy has been used to study the success of the growth for further investigations and advanced applications such as solar cells. Solar manufacturers are looking for approaches to improve yield and cell efficiency and lower manufacturing costs overall. One of the main goals of this project is to tear down the various parameters involved in the current photovoltaic panels and improve it in one or more directions (properties, performance, costs). The current study is addressing the solar market with special concern of the efficiency goal. The mechanical flexibility of plastic materials is of high demands for all photovoltaic applications onto curved surfaces for architectural integration. Polycarbonate AND/OR poly methyl methacrylate encapsulation of photovoltaic modules and usage to fabricate advanced silicon nanowires solar cells can be emerging technologies delivering excellent performance and durability at a competitive cost. Although solar panels with glass protective facing still account for the majority of the installations of photovoltaic modules, however, it is expected that the adaptation of these new technologies will rapidly gain market share. The growth of silicon nanowires using chemical vapor deposition to fabricate advanced solar cells can be done via two innovative approaches. Alternative techniques for lithographic formation of the mask can provide advantages for low-cost processing, especially where a simple repeating pattern is required.