Two-dimensional simulation of non-equilibrium silicon nitride plasma discharge for thin film solar cell deposition

Abstract

In this work, we model a Two-dimensional (2D) radiofrequency (RF) plasma discharge of hydrogenated silicon nitride (SiH4/NH3/H2) in a capacitive coupled plasma reactor (CCP), using non-Maxwellian electron energy distribution function (EEDF). The purpose is to investigate whether there is a real advantage and a significant contribution in 2D simulation using non-Maxwellian EEDF rather than Maxwellian one for determining the fundamental characteristics of radiofrequency plasma discharge. The results show a comparative study of the 2D evolution of the fundamental characteristics of the RF plasma using Maxwellian and non-Maxwellian EEDF. By considering the criterion of the density and the electronic temperature, the analysis of the results shows that the adoption of the non-equilibrium 2D EEDF makes it possible to obtain an approximation closer to the real conditions and thus a better understanding of the plasma discharge.