Abstract
In order to overcome the small current drivability of a tunneling field-effect transistor (TFET), we have introduced a TFET with the SiGe body and elevated Si drain region. The proposed TFET features large on-current and lower subthreshold swing (SS) compared with the Si TFET. Also, by using elevated Si drain region, it is expected that ambipolar current can be suppressed. Through the technology computer aided design (TCAD) simulation, the characteristics of the proposed TFET have been investigated to confirm its superiority in performance. The proposed TFET structure enables self-aligned doping process and has a strong immunity to short-channel effects compared with the conventional TFET. In addition, we have confirmed that both n- and p-channel characteristics can be simultaneously improved by using the proposed TFET.
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