Abstract
FePtCo ternary alloy films have been grown on Si-substrate by co-sputtering of Co with FePt under three conditions i.e., as-deposited, in-situ annealed, and with Cu-underlayer using a DC magnetron sputtering. The film surface roughness, crystal structure, and magnetic properties of these films were investigated. The average surface roughness (Sa and Ra) of these films deposited under three deposition conditions slightly varies in the range of 0.41–2.48 nm with the increase of Co content. The XRD results show that all the films crystallize in a close-packed FCC structure. The lattice parameters and average crystallite size decrease with an increase in Co concentration for all deposited conditions. The magnetic measurement indicates that the as-deposited films exhibit low coercivity and excellent in-plane magnetic anisotropy with a large effective anisotropy energy in the range of 1.22×106−1.88×107 erg/cc. The increase of Co content in as-deposited FePtCo films leads to a reduction in the saturation magnetization (MS) and Keff by promoting antiferromagnetic interaction with FePt sublattice. However, the annealing and insertion of a 2 nm Cu-underlayer further help to enhance the ferromagnetic nature and as a result, the value of MS and Keff is enhanced with an increase of Co content.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
