Abstract
A new software package has been developed for the tolerancing of complete electron and ion beam columns. The software computes the asymmetry aberrations caused by small mechanical imperfections in the construction and alignment of the lenses and deflectors. The imperfections considered include misalignments, tilts and ellipticities of individual polepieces, electrodes, coil windings and deflection plates. The asymmetry fields due to these mechanical errors are computed by perturbation methods, and the resulting parasitic aberrations are evaluated with asymmetry aberration integrals. The effects of aberration correction elements, such as alignment coils and stigmators, are also handled by the software. The overall effects of the aberrations can be displayed graphically. Illustrative results are presented for nanolithography and high-throughput lithography systems.
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