Abstract
Tip-based electron beam induced deposition is performed using field emission of low-energy electrons from the tip of an active (i.e., self-sensing and self-actuating) atomic force microscope cantilever inside a scanning electron microscope. By using the active cantilever for feature placement and metrology combined with fast switching between field-emission and noncontact imaging mode, high placement accuracy and time-efficient, precise 3D measurement of the deposits are enabled. First results on the effect of electron energy and exposure dose on the growth rates and dimensions of the deposits are presented, and the potential to increase spatial resolution due to the enhanced localization of the dissociation reactions induced by the low-energy electrons is discussed.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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