Abstract
TiO2 nanofilms on surface of fused silica were fabricated by Ti ion implantation and subsequent thermal annealing in oxygen ambience. The silica glasses were implanted by 20 k V Ti ions to 1.5 × 1017ions/cm2 on an implanter of metal vapor vacuum arc(MEVVA) ion source. Effects of annealing parameters on formation,growth and phase transformation of the TiO2 nanofilms were studied in detail. Optical absorption spectroscopy,Raman scattering spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy measurements were done to figure out formation mechanism of the TiO2 nanofilms.The formation of TiO2 nanofilms was due to out-diffusion of the implanted Ti ions to the substrate surface,where they were oxidized into TiO2 nanoparticles. Formation, phase, and thickness of the TiO2 nanofilms can be well tailored by controlling annealing parameters.
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