Time-resolved cathodoluminescence measurement of the effects of α -particle-related damage on minority hole lifetime in free-standing n-GaN

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Time-resolved cathodoluminescence using 30 keV ultrafast electron pulses has been used to perform direct measurements of the minority hole lifetime τh as a function of 3.7 MeV α-particle fluence in high-quality free-standing n-type GaN substrates. The lifetime damage factor K calculated from these measurements was found to monotonically decrease from 6.9 × 10−2 to 6.4 × 10−4 cm2 s−1 ion−1 with increasing α-fluence from 108 to 1012 cm−2, implying a reduction in trap cross section and/or an aggregation of α-induced traps. The small, ∼200–300 nm, hole diffusion length estimated from the minority hole lifetime for the highest α-fluence necessitates the deployment of α-voltaic device strategies and architectures that emphasize depletion and drift over diffusion for effective charge collection and optimal power conversion efficiency.