Abstract
Due to their ability to microphase separate into well ordered structures with periodicities on the nanometre scale, block copolymers have received widespread attention as building blocks for the fabrication of nanomaterials. In particular, thin films of block copolymers promise new technological breakthroughs in e.g. computer memory applications. This Review gives a short overview of progress that has been made in preparing suitable thin films of conventional coil–coil diblock copolymer systems, while the advantages as well as the complexities of using more unconventional systems such as triblock copolymers and supramolecular systems are emphasized.
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