Abstract
Thin film materials particles creation pulsed methods such as magnetron sputtering HiPIMS, pulsed laser deposition PLD, vacuum arc pulsed discharge, high-intensity pulsed ion beam impact HIPIB, as well, were described. It was shown that the stream of material, created by means of an explosion action such as ablation, avalanche paired impacts and microsecond electrical disruption as well creates preconditions for nanocrystalline thin film coating manufacture.
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