Abstract
The most known methods of pulsed thin film deposition such as magnetron sputtering HIPIMS, pulsed laser deposition PLD, vacuum arc pulsed deposition, high-intensity pulsed ion beams deposition HIPIB, as well, were described and analysed. It was shown that the stream of material, generated by means of a pulsed action, impacts to substrate and creates preconditions for nanocrystalline amorphous coating manufacture with superhigh hardness.
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