Abstract
The influence of heat treatment on the structure and electrical properties of Nix(NbO)100–x thin films obtained by the ion-beam sputtering of a composite target is investigated. The composite structure is found to be formed during the deposition of Ni–NbO films and to contain a mixture of nanoscale face-centered cubic (fcc) Ni grains and amorphous niobium oxide. Annealing at 550°C leads to the crystallization of amorphous niobium oxide; however, the heterogeneity and nanoscale structure of composites are maintained.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
