Abstract
The electromigration in thin gold films was studied by means of direct drift velocity measurements. A threshold in the electromigration drift velocity was found, and its value is inversely proportional to the gold stripe length. Electron-beam-deposited films, in contrast to sputtered ones, also demonstrated the presence of an incubation time for the cathode displacement. The electromigration activation energy was found to be 0.67–0.72 eV and the effective charge -0.3 to -186. In addition, alloyed Au-10 vol.% Mo specimens were examined. These films showed a much slower mass transport from the anode to the cathode—the opposite direction to that of non-alloyed gold films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
