Abstract
The electromigration in thin gold films was studied by means of direct drift velocity measurements. A threshold in the electromigration drift velocity was found, and its value is inversely proportional to the gold stripe length. Electron-beam-deposited films, in contrast to sputtered ones, also demonstrated the presence of an incubation time for the cathode displacement. The electromigration activation energy was found to be 0.67–0.72 eV and the effective charge -0.3 to -186. In addition, alloyed Au-10 vol.% Mo specimens were examined. These films showed a much slower mass transport from the anode to the cathode—the opposite direction to that of non-alloyed gold films.
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