Abstract
Molybdenum-tellurium alloy thin films were fabricated by electron beam evaporation and the films were annealed in different conditions in N2ambient. The hexagonal molybdenum ditelluride thin films with well crystallization annealed at 470°C or higher were obtained by solid state reactions. Thermal stability measurements indicate the formation of MoTe2took place at about 350°C, and a subtle weight-loss was in the range between 30°C and 500°C. The evolution of the chemistry for Mo-Te thin films was performed to investigate the growth of the MoTe2thin films free of any secondary phase. And the effect of other postdeposition treatments on the film characteristics was also investigated.
Highlights
Molybdenum ditelluride (MoTe2 ) belongs to the large family of layered transition metal dichalcogenides, which is bound by weak van der Waals interactions along the c-axis [1]
Molybdenum-tellurium alloy thin films were deposited by electron beam evaporation at room temperature in the pressure of ∼10−4 Pa
The deposition rates of molybdenum and tellurium were monitored by a thickness monitor
Summary
Molybdenum ditelluride (MoTe2 ) belongs to the large family of layered transition metal dichalcogenides, which is bound by weak van der Waals interactions along the c-axis [1]. The electronic, optical, magnetic, and catalytic properties of the transition metal dichalcogenides have been extensively studied [2,3,4,5,6]. MoTe2 can act as an efficient absorbing layer in solar cells only if the crystallites of the films are textured with the c-axis perpendicular to the plane of the substrate [7]. Because of the layered structure of MoTe2 , various metal atoms can be doped between the layers to change its optical and electrical properties [8]. The structural property and stability of Mo-Te thin films were investigated under different postdeposition treatment conditions
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