Abstract
ITO thin films have been produced by electron beam evaporation and submitted to a post-deposition annealing to study the effect of heat treatments on the optoelectronic characteristics of the films. The electrical and optical characteristics of the ITO thin films after annealing showed that high quality material can be prepared reproducibly with the transmission being largely controlled by annealing step in air and the electrical properties being improved by a subsequent anneal under a reducing atmosphere. In this paper we will report Transmission Electron Microscopy and X-Ray Diffraction results on the microstructural evolution of the ITO films at each stage of fabrication process. These will be correlated with the electrical and optical characteristics of the films at each corresponding stage.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
