Abstract
The electrochemical performance of ion conducting thin films depends strongly on the deposition method. This provides a possibility of tailoring thin films with new functional properties. A comparative study was made between rf-sputtering and electron beam evaporation which are the two most commonly employed methods for the preparation of thin films. For this purpose, thin films of Li3±xPO4±yNz were rf-sputtered and electron beam evaporated and investigated with regard to the electrochemical properties. It was found that solid thin films of the electrolyte Li3±xPO4±yNz may be sputtered, but not electron beam evaporated. Compared to rf-sputtered Li1±xCoO2±y and C thin films, electron beam evaporated Li1±xCoO2±y and C thin films show chemical diffusion coefficients which are at least one order of magnitude higher.
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