Abstract

We report on the effect of external strain on the two-dimensional electron gas density in AlGaN/GaN heterostructures grown on sapphire by low pressure metalorganic chemical vapor deposition. The electron sheet concentration in the studied samples was 4×1012–2×1013 cm−2 and decreased with compressive strain. Lower doped heterostructures had a higher sensitivity to applied strain. The comparison between the experimental data and our model shows that the GaN layers are primarily nitrogen terminated at the heterointerface.

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