Abstract
Epitaxial layers of GaAs are grown from Ga solution. The effects of oxygen in achieving high purity GaAs layers are investigated. From the experimental results of doping with Ga2O3, the growth temperature dependence of carrier concentration and the impurity profile are explained by the temperature dependence of the distribution coefficient of oxygen in GaAs grown by liquid phase epitaxy. The distribution coefficients of oxygen are 6.5×10-4 at 700°C, 1.8×10-4 at 750°C and 5.1×10-5 at 800°C, respectively.
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