The influence of deposition temperature on growth mode, optical and mechanical properties of ZnO films prepared by the ALD method

Abstract

Nanocrystalline ZnO thin films were deposited on glass substrates via the atomic layer deposition (ALD) method at different temperatures ranging from 50 to 200°C. The influences of deposition temperature on the film growth mode, growth rate, optical and mechanical properties of the ZnO films were investigated. At a critical temperature of 100°C, ZnO films exhibited a series of changes. X-ray diffraction (XRD), atomic force microscopy (AFM), UV–vis spectra, room temperature photoluminescence (PL) spectra and nano-indentation measurement were used to analyze these variations.