The FMR line width and the structure in YIG films deposited by MOD on silicon (1 0 0)

Abstract

In this work, yttrium-iron garnet (YIG) films deposited on silicon subtract were studied by ferromagnetic resonance (FMR). The samples were prepared by using the Metal-Organic Decomposition (MOD) method on two different thermal treatments (750 °C and 850 °C). The X-ray diffraction suggested the single phase of YIG while atomic force microscopy and scanning electron microscopy reveled film roughness, Rq < 0.2 nm. The FMR measurements showed very different linewidth of 139 Oe for the sample obtained at 750 °C and sample at 850 °C had a smaller linewidth of 93 Oe. The difference was mainly attributed to the different structural ordering of the two samples from the heat treatment at different temperatures.