The Effect of Carrier Injection Stress on Boron-Doped Amorphous Silicon Suboxide Layers Investigated by X-ray Photoelectron Spectroscopy

Abstract

In amorphous silicon solar cells, reducing degradation is one of the key issues in improving cell performance. The degradation of the p-layer can play an important role since it is directly related to the open circuit voltage (Voc) and fill factor (FF) in the cells. In this study, we investigated the changes in boron-doped p-type silicon suboxide (SiOx) layers after carrier injection stress. The boron doping level was varied by controlling B2H6 gas flow rate. When these layers were degraded, the dark conductivity decay decreased from 53% to less than 5%, and the increase in activation energy decreased from 11 to 0.5% depending on the B2H6 gas flow rate increase. Our improvements are explained in conjunction with the three- and four-fold coordinated boron atoms by the shift of the B 1s X-ray photoelectron spectrum. In this paper we present how to improve the stability of hydrogenated amorphous silicon (a-Si:H) thin-film solar cells.